Ulvac, Inc.

Yuya Inoue

Hisato Tanaka

Tamotsu Tanifuji

Masao Murata

Makoto Takahashi

Koji Hane

Kuniyoshi Sekine

Junpei Yuyama

Robert F Taff

Hiroto Uchida

Yasuzo Tanaka

Takumi Namekawa

Takanori Tsuji

Hiroshi Koshina

Ralph D Fox

Robert R McKay

Kei Baba

Robert D Taff

A substrate transfer processing apparatus capable of processing a substrate at high speed is provided. A mounting table on which a substrate is mounted includes a plate-shaped main body and a recessed part formed in a rear surface of the plate-shaped main body. Since the mounting table is lightweight as compared to the mounting table before the recessed part is formed therein, the load on a motor is small and the running cost is low even when the mounting table is moved at high speed. Because the plate-shaped main body is made of granite, the mounting surface can be made flat and smooth by polishing. Since the mounting surface is flat and smooth, the accuracy in positioning the substrate is high.

Substrate transfer processing apparatus

Provided is a substrate stage which can transfer a substrate at a high speed. In the substrate stage of the present invention, auxiliary mounting tables are attached to a main mounting table, and lower rails are arranged over on the main mounting table and above the auxiliary mounting tables. When both ends of the lower rails are bent upwardly by a vertically adjusting unit in order to prevent the both ends of the lower rails to be bent downwardly, the lower rails are made straight. Since the lower rail is not divided, the linearity is ensured and the moving plate does not stutter so that transfer of the substrate at high speed can be performed.

Stage

A movable table, which has a substrate to be processed mounted thereon and moves, includes: a main plate formed of a metallic material; and a plurality of sub plates which is disposed on the main plate and is formed of a material with a hardness higher than the metallic material, and the top surfaces of the plurality of sub plates are mounting surfaces of the substrate to be processed.

Movable table and processing stage

The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.

Applicator and method for transferring dispersion liquid

According to a first invention, since a flow of a spacer dispersed liquid is formed in a transporting chamber separated from a discharging chamber by an internal filter, the spacer dispersed liquid is stably discharged through an ejection hole, while the discharging chamber on a side of a nozzle plate is not affected by the flow of the spacer dispersed liquid. According to a second invention, since a spacer dispersed liquid does not flow inside a discharging chamber in a printing state in which the spacer dispersed liquid is discharged, the spacer dispersed liquid is stably discharged through an ejection hole. To the contrary, since the spacer dispersed liquid is directed inside both the discharging chamber and the transporting chamber in a waiting state in which the spacer dispersed liquid is not discharged, spacer particles in the spacer dispersed liquid do not settle.

Head module, printing apparatus, and printing method

Growing community of inventors

Chigasaki, Japan

Yuya Inoue