Carl Zeiss Smt Gmbh

Tag Dream Medical Ltd.

Carl Zeiss Sms Ltd.

Yuval Perets

Hagay Sitry

Ran Weisman

Zachary Sacks

Hagay Botansky

Sergey Oshemkov

Vladimir Kruglyakov

Frederik Blumrich

Yaron Tal

Dan Nabel

Dan Michael

Yehuda Ben Ami

Vladimir Dmitriev

Thomas Scheruebl

Joachim Welte

Thomas Thaler

Ute Buttgereit

Kujan Gorhad

A tool has a handle and an elongate shaft that extends distally from the handle. A distal portion of the shaft is inserted into a subject during a surgical procedure. An optical fiber delivers laser energy to a tip at the distal portion of the shaft. The tip includes a mechanical cutting mechanism including a moving part that absorbs the laser energy, thermally conducts the absorbed energy to tissue that is disposed between the moving part and another part, and moves with respect to the other part in order to cut tissue that is disposed between the parts using a mechanical force that is lower than a mechanical force that would be required to cut the tissue in the absence of the laser energy. Other embodiments are also described.

Hybrid laser cutter

A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.

Critical dimension variation correction in extreme ultraviolet lithography

The invention relates to a method for correcting the critical dimension uniformity of a photomask for semiconductor lithography, comprising the following steps:

Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography

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Moshav Beit Shearim, Israel

Yuval Perets