Jsr Corporation

Yuuko Kiridoshi

Tsuyoshi Furukawa

Takeo Shioya

Hiroyuki Nii

A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. Rrepresents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; Rrepresents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Mrepresents a monovalent cation; and Rrepresents a monovalent organic group having 1 to 30 carbon atoms.

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Tokyo, Japan

Yuuko Kiridoshi