Shin-etsu Chemical Co., Ltd.

Yuuki Suka

Koji Hasegawa

Yuji Harada

Takeshi Sasami

Takeshi Kinsho

Takeru Watanabe

Masayoshi Sagehashi

Masashi Ilo

A fluorinated ester monomer is provided having formula (1) wherein Ris H, CHor CF, Rand Rare H or a monovalent hydrocarbon group, or Rand Rforms a hydrocarbon ring, Ris a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials. 

Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid

A protective film-forming composition comprising a polymer comprising fluorinated alcohol units of the structure: &#x2014;C(CF)ORwherein Ris H or a monovalent hydrocarbon group and having a Mw of 1,000-500,000 is applied onto a resist film to form a protective film thereon. The protective film-forming composition has high water repellent and water slip performance. The protective film exhibits barrier properties to water and prevents any resist components from being leached out in water.

Resist protective film-forming composition and patterning process

Polymerizable ester compounds having formula (1) are novel wherein Ris H, F, methyl or trifluoromethyl, Ris an acid labile group, Aa is a divalent hydrocarbon group which may be separated by &#x2014;O&#x2014; or &#x2014;C(&#x2550;O)&#x2014;, and kis 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation &#x2266;500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties. 

Polymerizable ester compound, polymer, resist composition, and patterning process

A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. Ris H, F, methyl, or trifluoromethyl, Ris a monovalent fluorinated hydrocarbon group, Ais a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3. 

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Joetsu, Japan

Yuuki Suka