Kawatetsu Mining Co., Ltd.

Kawasaki Steel Corporation

Solar Frontier K.k.

Yuuki Narita

Shinji Kato

Hideki Sakai

Mitsuru Onoda

Yoshio Aso

Shuetsu Ogasawara

Akira Seki

Bagwadkar Ninad

Shunroh Nagata

Toshiaki Yamaura

Tatsuji Kanbara

Mitsuru Arasaki

Tetsuji Itou

Shunro Nagata

Tomoyasu Yamada

Seki Akira

Natsuki Hamada

Takero Ito

In an attachment structure for attaching a photovoltaic cell module having flexibility to an installation surface or an attachment member, a back surface of the photovoltaic cell module is attached to the installation surface or the attachment member by being adhered by an adhesive material.

Attachment structure of photovoltaic cell module

A method for producing high-purity iron oxide which comprises pulverizing iron ore into powder having an average particle diameter of 20-150 .mu.m, removing fine particles from the powder, and subjecting the powder to wet magnetic separation in a magnetic field of 1000-15000 gauss for the removal of impurities. The iron oxide powder may undergo the secondary steps of pulverization and classification, which are performed by the combination of a wet grinding means and a wet cyclone, and drying and calcination.

High purity iron oxide and method for production hereof

This invention concerns a process for producing high purity silica with less than 5 ppm of impurities from cheap alkali silicate aqueous solution (water glass) for industrial use, which commonly contains more than 2000 ppm of impurities, by directly adding water glass to a mineral acid solution, such as hydrochloric acid, nitric acid, and sulfuric acid so as to dissolve impurities in the mineral acid solution and form silica precipitate, and then rinsing the silica precipitate with a mineral acid solution, provided that the viscosity of the water glass is adjusted to 10-10000 poise in advance of adding to the mineral acid solution.

Process for producing high purity silica

This invention concerns a process for purifying silica produced from an alkali silicate aqueous solution, which usually contains more than 200 ppm of impurities, to silica containing less than 30 ppm of impurities. Concretely, the purification process of silica comprises: dispersing silica gel, containing a lot of impurities, in water and filtering the solution; dispersing the filtered out silica gel again in an aqueous solution of pH 2 or less and filtering the aqueous solution; putting the silica gel to heat-treatment and acid-treatment with continuous stirring in order to break the inside siloxane link and dissolve out impurities therefrom and filtering the acid solution; rinsing a produced cake with pure water to wash away the inside residual solution and drying the cake.

Process for purifying silica

Growing community of inventors

Tokyo, Japan

Yuuki Narita