Matsushita Electric Industrial Co., Ltd.

Matshushita Electric Industrial Co., Ltd.

Yuuji Omata

Naotaka Hashimoto

Masahide Yokoyama

Toshiyuki Suemitsu

Takahiro Kitai

Tatsuo Mifune

Takeshi Arakawa

Akira Hochi

Nobuyuki Komura

Kiyoshi Hashimotodani

Yoshihisa Hagiwara

Noboru Nomura

Hiroshi Sakakima

Satoru Mitani

Koichi Osano

Kenji Kanai

Koichi Kugimiya

Nobuyuki Kaminaka

Katsushi Seki

Koichi Katase

Hiroki Asai

A bulb type electrodeless discharge lamp, comprising a recessed part (), wherein the maximum diameter of a light emitting tube () is 60 to 90 mm and the tube wall load of the light emitting tube () is 0.07 to 0.11 W/cm, and a relation between the diameter Dc of the recessed part () and an interval &#x394;h between the top of the recessed part () and the top part of the light emitting tube () meets the requirement of &#x394;h&#x2266;1.15&#xd7;Dc+1.25 [mm].

Compact self-ballasted electrodeless discharge lamp and electrodeless-discharge-lamp lighting device

An electrodeless discharge lamp operating device including a light-transmitting discharge bulb, an induction coil including a coreand a coil, and a ballast circuitfor supplying a high-frequency power to the induction coil. The operating frequency of the ballast circuitis in the range of 80 kHz to 500 kHz, and where the operating frequency of the ballast circuitis f (kHz) and the power input to the discharge bulbis P (W), the rare gas pressure p (Pa) in the discharge bulbsatisfies the relationship of the following expression: (where A, B and C are constants having the following values: A=4.0&#xd7;10, B=3.5&#xd7;10and C=6.2), and the power input P to the discharge bulbis 7 W at minimum and 22 W at maximum.

Electrodeless low-pressure discharge lamp operating device and self-ballasted electrodeless fluorescent lamp

When forming an optical thin film on a surface of a bulb of a light source such as an electric lamp or a discharge lamp, a thin film whose interface/surface is less rough is formed on a base having a spheroid shape. When forming a thin film on a basewith a spheroid shape, which is disposed in a vacuum chamberof a film-forming device and spun on its rotation axis, an interface or a surface of the thin film is made less rough and the thickness distribution of the thin film is made smaller by setting a sputtering gas pressure to be in a range from 0.04 Pa to 5.0 Pa; by using, as a sputtering gas, a mixed gas of Ar gas and Ngas in which the Ngas is present at a partial pressure ratio of 1 to 6 assuming a partial pressure of the Ar gas is 100, or a mixed gas of Ar gas, Ngas, and Ogas in which the Ngas is present at a partial pressure ratio of 1 to 6 and Ogas is present at a partial pressure ratio of 6 or less assuming a partial pressure of the Ar gas is 100; by setting an input power applied at the start of thin film formation to be the greatest throughout a sputtering process; or by applying a negative bias to the base.

Thin film producing method and light bulb having such thin film

The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids.

Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation

A soft-magnetic multilayer thin film produced by electroplating, wherein an anode-dissolution process is effected by intermittently applying a reverse d.c. bias current with respect to the plating-forward current. Involving the anode-dissolution process allows the formation of a re-dissolution effect layer differing in crystal structure from the plated film layer. A soft-magnetic multilayer thin film characterized by having a multilayer film structure which comprises a plated layer and a re-dissolution effect layer laminated to each other and which the plated layer is at least magnetically isolated. Further, a method of manufacturing a soft-magnetic multilayer thin film having a multilayer film structure magnetically isolated only through plating, which is offered by introducing the anode-dissolution process. In a thin-film magnetic head produced by using a soft-magnetic multilayer thin film, the soft-magnetic multilayer thin film serves as at least one of an upper magnetic core layer and a lower magnetic core layer.

Soft-magnetic multilayer thin film for use in a thin-film magnetic head

Method of manufacturing soft-magnetic multilayer thin film including

A magnetic thin film head having a laminated structure includes a non-magnetic substrate, a lower magnetic layer deposited on the non-magnetic substrate, a magnetic gap layer overlying the lower magnetic layer, at least two insulating layers overlying the magnetic gap layer, at least one electrically conductive layer interposed between the insulating layers, and an upper magnetic layer overlying the insulating layers. A magnetic core of the magnetic thin film head is made up of the upper and lower magnetic layers, at least one of which includes a plurality of magnetically soft layers plated with a metal alloy and a plurality of modified layers each interposed between two adjoining magnetically soft layers. The modified layers function to magnetostatically separate the magnetically soft layers. Each of the modified layers is made by introducing, during electroplating, an anodic dissolution process wherein a surface to be plated is temporarily used as an anode.

Method of making a magnetic core of a magnetic thin film head

A soft magnetic multilayer film is manufactured by an electroplating process using an electrolyte containing metal ions. The soft magnetic multilayer film includes soft magnetic layers composed of elements, and deteriorated-soft magnetic layers composed of the same elements and alternating with the soft magnetic layers. The soft magnetic layers are preferably different in composition from the deteriorated-soft magnetic layers. In addition, it is preferable that the metal ions contained in the electrolyte include at least two of Ni ion, Co ion, and Fe ion.

Soft magnetic film with compositional modulation and method of

A method of producing a thin film magnetic head in which at least one of two, lower and upper, magnetic layers is formed of a soft magnetic amorphous alloy thin film of a given pattern shape, includes the steps of preparing a soft magnetic thin film to communicate directly or magnetically with the soft magnetic amorphous alloy thin film so that an external magnetic field can effectively be applied, during in-field heat treatment, to the soft magnetic amorphous alloy thin film of the head core assembly from a direction at a right angle to the direction of a head core magnetic path, inducing uniaxial magnetic anisotropy in the soft magnetic amorphous alloy thin film through heat treatment in the external magnetic field, and removing the soft magnetic thin film for application of the external magnetic field during the in-field heat treatment. Also, another form of the method in which at least one of two, lower and upper, magnetic layers is formed by electroplating of a soft magnetic alloy thin film of a given pattern shape, includes the steps of preparing a soft magnetic thin film to communicate directly or magnetically with the soft magnetic electroplated alloy thin film so that an external magnetic field can effectively be applied, during in-field electroplating action, to the soft magnetic electroplated alloy thin film of the head core assembly from a direction at a right angle to the direction of a head core magnetic path.

Method of producing a thin film magnetic head

Disclosed is a soft-magnetic film having high saturation magnetic-flux density. The soft-magnetic film is made of an alloy containing as its main components Fe, Co and Ni in the proportion: 20%&lt;Fe&lt;75%, 5%&lt;Co&lt;45% and 20%&lt;Ni&lt;70% (at %) and has a structure in which (110) or (111) planes of a face-centered cubic-lattice structure are given to its thin-film surface, as a preferred crystallographic orientation. The thin-film alloy may contain less than 5% of Cr, Ti, Zr, Hf or the like. The thin film of this alloy is formed by evaporation, electroplating or the like.

Soft-magnetic film having saturation magnetic-flux density and magnetic

A ternary FeCoNi alloy film exhibiting a high magnetic flux density is produced by performing electrodeposition at a cathodic electrode using an electrolytic bath for electrodeposition fed with Fe, Co and Ni ions from sulfates, hydrochlorides or mixtures thereof containing respective divalent ions of Fe, Co and Ni, said bath containing a composition having ratios of divalent ion concentrations in the bath in the ranges:

Process for producing a thin alloy film having high saturation magnetic

A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four types of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, Cr and Cu ions, by using a bath having on the basis of the density of [Ni.sup.2+ ] ion such compositions as 0.02&lt;[Co.sup.2+ ]/[Ni.sup.2+ ]&lt;0.9, 0.095&lt;[Fe.sup.2+ ]/[Ni.sup.2+ ]&lt;0.4 and 0.075&lt;[Cr.sup.3+ ]/[Ni.sup.2+ ]&lt;0.4, or 0.001&lt;[Cu.sup.2+ ]/[Ni.sup.2+ ]&lt;0.03; and arranging electrodeposition current density J to be in a range of J&lt;60 (mA/cm.sup.2) at the cathode.

Method of manufacturing high magnetic flux density electrodeposited

Soft magnetic laminated materials having both superior wear resistance and a high saturation magnetization comprising Fe-Si alloy films 1 having small magnetostriction, and films 2 of an amorphous alloy or Fe-Si-Al alloy having both small magnetostriction and excellent wear resistance, said first and second films being alternately laminated, the thickness (t.sub.1) of the first film and the thickness (t.sub.2) of the second film being made to meet the following conditions: ##EQU1##

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Toyonaka, Japan

Yuuji Omata