Fujimi Incorporated

Yuuichi Ito

Kazusei Tamai

Maiko Asai

Hitoshi Morinaga

Hiroshi Asano

Muneaki Tahara

Toru Kamada

Shota Hishida

Shingo Otsuki

Kyosuke Tenko

Tomoya Ikedo

Provided are an abrasive, a polishing composition, and a polishing method capable of polishing the surface of an alloy or metal oxide at a sufficient polishing removal rate and providing a high-quality mirror surface. The abrasive contains alumina having an &#x3b1;-conversion rate of 80% or more and having a 50% particle diameter, in a volume-based cumulative particle diameter distribution, of 0.15 &#x3bc;m or more to 0.35 &#x3bc;m or less. The polishing composition contains this abrasive and has a pH of 7 or less. These abrasive and polishing composition are used for polishing polishing objects containing at least one of an alloy and a metal oxide.

Abrasive, polishing composition, and polishing method

To provide a polishing pad capable of sufficiently polishing, in polishing of an object to be polished having at least one of a projection portion and a recessed portion on the surface, a portion near the projection portion or the inner surface of the recessed portion of the surface of the object to be polished. The polishing pad has a piloerection portion () in which a plurality of fibers () having a length of 2 mm or more are raised on the surface of a base (), in which the mass of the fibers () is 250 g/mor more. The polishing pad is used for polishing an object to be polished () containing metal, an alloy, or a metal oxide material and having at least one of a projection portion () and a recessed portion () on the surface.

Polishing pad and polishing method

Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.

Polishing composition, polishing method, and method for manufacturing ceramic component

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Aichi, Japan

Yuuichi Ito