Jsr Corporation

Yuuichi Eriyama

Hideaki Takase

Tomohiro Utaka

Kentarou Tamaki

Yukio Hosaka

Ryo Tanaka

Nobuyuki Miyaki

Takahiro Shimizu

Hideyuki Fujiwara

Fujio Sakurai

Motoki Okaniwa

Yukio Maeda

Kouji Senoo

Satoshi Shimobaba

Jun Huangfu

Shinji Ohba

The present invention relates to a production process for an electrode material, an electrode and an electric storage device, and the production process for an electrode material comprises a step of heating a polymer having a silicon-containing unit and a silicon-non-containing unit.

Production process for electrode material, electrode and electric storage device

There is provided a photosensitive resin composition for forming an optical waveguide which has high shape precision and excellent transmission characteristics under high temperature and high humidity. A composition of the present invention contains (A) a polymer having structures represented by the following general formulae (I) and (2) (in the formulae, each of Rand Ris independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; Ris an organic group containing a radical-polymerizable reactive group; X is a single bond or a bivalent organic group; and Y is a non-polymerizable organic group), (B) a compound having at least one ethylenic unsaturated group in the molecule thereof, having a molecular weight below 1,000 and having a boiling point of at least 130&#xb0; C. at 0.1 MPa, and (C) a photoradical polymerization initiator.

Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof

A radiation-sensitive resin composition for forming optical waveguides, which comprises (A) a novolac type epoxy resin and (B) a photo-acid generator. The composition is used as materials for a core portionof an optical waveguide, and the like. In the composition, component (A) is represented by the following general formula (1). (In the formula, Ris a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aralkyl group; and n is an integer from 0 to 10.) The composition is excellent in patterning properties and the like in curing process, and is also excellent in heat resistance, transmission characteristics, and long-term reliability after the optical waveguide has been formed.

Photosensitive resin composition for optical waveguide formation and optical waveguide

A photosensitive resin composition for optical waveguide formation, comprising: (wherein Ris &#x2014;(OCHCH)&#x2014;, &#x2014;(OCH(CH)CH)&#x2014;, or &#x2014;OCHCH(OH)CH&#x2014;; X is &#x2014;C(CH)&#x2014;, &#x2014;CH&#x2014;, &#x2014;O&#x2014;, or &#x2014;SO&#x2014;; Y is a hydrogen atom or a halogen atom; m is an integer of 0 to 4); (wherein Ris &#x2014;(OCHCH)&#x2014;, &#x2014;(OCH(CH)CH)&#x2014;, or &#x2014;OCHCH(OH)CH&#x2014;; Y is a hydrogen atom, a halogen atom, Ph-C(CH)&#x2014;, Ph-, or an alkyl group having 1 to 20 carbon atoms; p is an integer of 0 to 4; Ph is a phenyl group); and

An optical waveguide chip including a core portion as an optical waveguide, a clad portion composed of a lower clad layer and an upper clad layer, and an optical fiber guide portion which is formed integrally with the clad portion for positioning a single-mode optical fiber which is to be connected with the core portion. Each portion of the optical waveguide chip is formed by creating a layer of a radiation-sensitive polysiloxane composition by photolithography. At least two kinds of radiation-sensitive polysiloxane compositions are used so that the core portion has a higher refractive index than the clad portion.

Optical waveguide chip and optical component comprising same

A radiation-curable composition containing (A) hydrolyzates of hydrolyzable silane compounds represented by general formula (1): (R)(R)Si(X)(wherein Ris a non-hydrolyzable organic group having 1 to 12 carbon atoms that contains fluorine atoms, Ris a non-hydrolyzable organic group having 1 to 12 carbon atoms (but excluding ones that contain fluorine atoms), X is a hydrolyzable group, p is an integer of 1 or 2, and q is an integer of 0 or 1) and condensates of such hydrolyzates, and (B) a photo acid generator, wherein the ratio of silanol (Si&#x2014;OH) groups in the composition is 0.1 to 0.5 out of all the bonding groups on Si. With such a composition, the waveguide loss is low for light having a wavelength in a broad range from the visible region to the near infrared region, and moreover the cracking resistance, the patterning ability upon irradiation with radiation, and so on are excellent.

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Tokyo, Japan

Yuuichi Eriyama