Sony Corporation

Sony Group Corporation

Sony Semiconductor Solutions Corporation

Yuu Kawaguchi

Takashi Sakairi

Koichi Amari

Tsuyoshi Okazaki

Keiichi Maeda

Tadayuki Dofuku

Kunihiko Hikichi

Tomoaki Honda

Kazuhiro Tamura

Takuma Matsuno

Masahiro Kaida

Yosuke Takita

Hideki Kawaguchi

Seiya Haraguchi

Takayoshi Masaki

Takuya Fujino

Atsushi Tanaka

Toshiaki Okada

Kouta Fukumoto

Chiho Araki

Katsunori Dai

Shunsuke Narui

Yuuji Adachi

An electrode structure includes: a plurality of pixel electrodes arranged separately from each other; and a plurality of dielectric layers laminated in a first direction with respect to the plurality of pixel electrodes, in which the plurality of dielectric layers includes: a first dielectric layer that spreads over the plurality of pixel electrodes in a direction intersecting with the first direction; and a second dielectric layer that includes dielectric material having a refractive index higher than that of the first dielectric layer, sandwiches the first dielectric layer together with the plurality of pixel electrodes, and has a slit at a position overlapping space between pixel electrodes adjacent when viewed from the first direction.

Electrode structure, liquid crystal display device, projective display device, and method of manufacturing electrode structure

An etching process includes: forming a metal film on a substrate having a pattern formation region; forming a mask having a predetermined pattern on the metal film in the pattern formation region, and forming a resist film in part or all of a periphery of the pattern formation region; and dry-etching the metal film in the pattern formation region.

Etching process, method of manufacturing electronic device, and method of manufacturing polarizing plate

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Kumamoto, Japan

Yuu Kawaguchi