Canon Kabushiki Kaisha

Kabushiki Kaisha Toshiba

Mitsubishi Denki Kabushiki Kaisha

Canon Nanotechnologies, Inc.

Minolta Camera Kabushiki Kaisha

Yutaka Watanabe

Yasuaki Fukuda

Shunichi Uzawa

Mitsuaki Amemiya

Akira Miyake

Masami Hayashida

Ryuichi Ebinuma

Shigeru Terashima

Keiko Chiba

Shigetaro Ogura

Takashi Iizuka

Shinichi Hara

Nobutoshi Mizusawa

Kazuyuki Kasumi

Hiroshi Maehara

Masami Tsukamoto

Masayuki Suzuki

Ikuo Yoneda

Noritaka Mochizuki

Takao Kariya

Takayuki Hasegawa

Masayuki Hatano

Nobuaki Ogushi

Takuya Kono

Keiji Yamashita

Kenji Itoga

Masahito Niibe

Shinichiro Uno

Toyoki Kitayama

Hideyuki Chinju

Takeshi Yamamoto

Keiji Emoto

Jun Ito

Tsutomu Ikeda

Eiji Sakamoto

Setsuo Minami

Takeshi Miyachi

Hajime Kanazawa

Kazuki Fujimoto

Takahiro Nakayama

Masayuki Tanabe

Yasuo Kawai

Fumiaki Mizutani

Nobutoshi Mitzusawa

Mika Kanehira

Nobuaki Oqushi

An optical apparatus attachable to an image pickup apparatus and switchable a power state between a first state and a second state that consumes a power less than the first state includes a driver that drives a driven member, a first detector configured to detect a driving amount of the driver or whether the driven member is located at a predetermined position, a memory that stores a signal value of the first detector when the power state of the optical apparatus is switched from the first state to the second state, and a determiner that determines that the driver is in an abnormal state when the signal value stored in the memory and the signal value of the first detector when the power state of the optical apparatus is switched from the second state to the first state are different from each other.

Optical apparatus, image pickup apparatus, and driving method of optical apparatus

Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.

Imprint apparatus, imprint method, and article manufacturing method

A cameraand accessory devicesandperform communication via channels including a data communication channel used for data communication and a notification channel for notifying timing of communication performed via the data communication channel. Each of the accessory devicesandperforms switching from a first communication mode to a second communication mode upon receiving communication-partner designation data via the data communication channel with communication in the first communication mode, the communication-partner designation data indicating that the relevant accessory device has been selected as a communication partner with the camera

Accessory device, camera, storage medium, and camera system in which communication is performed via data and notification channels and employs differences in voltage level for the notification channel during a period in which data is received

An image pickup device includes a notification channel and a data communication channel for communication with an accessory device, the notification channel being used for signal transfer between the image pickup device and the accessory device, the data communication channel being used for data communication between the image pickup device and the accessory device. The image pickup device starts the communication with the accessory device when a voltage level of the notification channel takes a predetermined level.

Accessory device, camera, and storage medium

An accessory devicebeing able to switch an operating state between an active state and a sleep state in which power consumption is smaller than in the active state performs communication with a cameravia a notification channel CS used for signal transfer between the cameraand the accessory deviceand a data communication channel DATA used for data communication between the camera and the accessory device. The accessory device receives active instruction data that is transmitted from the camera in response to output of a predetermined signal from the accessory device in the sleep state via the notification channel, and switches the operating state of the accessory devicefrom the sleep state to the active state upon receiving the active instruction data.

An interchangeable lens serving as an accessory apparatus includes a power control unit configured to switch between a first power state where communication with a camera main body serving as an image pickup apparatus is possible and a second power state which provides smaller power consumption than the first power state. The interchangeable lens also includes a setting unit configured to switch a communication setting between a first setting corresponding to a first communication method that is a communication method used in an initial communication and a second setting corresponding to a second communication method different from the first communication method. In addition, in a case where the communication setting of the interchangeable lens is the second setting, the power control unit does not perform the switching from the first power state to the second power state.

Accessory apparatus for communicating with an image pickup apparatus,image pickup apparatus for communicating with an accessory appparatus, and imaging system providing techniques for communicating between an accessory apparatus and an image pickup apparatus

An accessory apparatus attached to an interchangeable lens attached to a camera body can switch between a first accessory power mode and a second accessory power mode consuming less power than the first accessory power mode. The power state of the accessory apparatus is set based on information regarding the power mode of the camera body and the power mode of the interchangeable lens.

Accessory apparatus and recording medium storing control program for accessory apparatus

The present invention provides a pattern forming method of forming a plurality of pattern layers on a substrate by using a plurality of lithography apparatuses including a first lithography apparatus and a second lithography apparatus, the method comprising a first step of forming a first pattern layer by the first lithography apparatus which adopts a die-by-die alignment method, based on alignment information obtained by using the die-by-die alignment method for a plurality of marks formed on the substrate by a lithography apparatus which adopts a global alignment method, and a second step of forming a second pattern layer so as to overlap with the first pattern layer by the second lithography apparatus, based on alignment information obtained by using the global alignment method for a plurality of shot regions formed on the substrate by the first lithography apparatus in the first step.

Pattern forming method and method of manufacturing article

Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.

The present invention provides a lithography system including an obtaining unit which obtains a transfer function describing a relationship between first vibration generated in one lithography apparatus of two lithography apparatuses among at least three lithography apparatuses, and second vibration generated in the other lithography apparatus upon transmission of the first vibration to the other lithography apparatus, and a calculator which calculates, based on the transfer function, an amount of vibration of a first lithography apparatus among the at least three lithography apparatuses due to vibration of lithography apparatuses, other than the first lithography apparatus, and a controller which controls the lithography apparatuses other than the first lithography apparatus, so that the amount of vibration calculated falls below a tolerance.

Lithography system and manufacturing method of commodities

An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.

Exposure apparatus and device manufacturing method

An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.

Exposure apparatus, control method for the same, and device manufacturing method

A light source apparatus for generating a plasma and supplying a light irradiated from the plasma to an optical system, said light source apparatus includes a chamber for accommodating a region that generates the plasma, wherein a density of a hydrocarbon compound included in a gas in the chamber is 300 ppb or less.

Light source apparatus, exposure apparatus and device fabrication method

An illumination apparatus for illuminating a target surface using light includes a light source that emits the light, a reflection integrator that forms plural secondary light sources using the light from the light source, and an optical unit that differentiates Helmholtz-Lagrange invariants in two orthogonal directions with respect to the light incident upon the reflection integrator.

Illumination apparatus and exposure apparatus

An exposure apparatus for exposing a mask pattern onto an object by using a light with wavelength of approximately 11 nm, said exposure apparatus including a projection optical system that includes a reflection-type optical element that has a multilayer film including a Be layer, and a reflection-type mask including a multilayer film that includes a first layer that has a first refractive index, and a second layer that has a second refractive index that has a real part that is larger than a real part of the first refractive index, said reflection-type mask includes the mask pattern, wherein said the first layer includes a beryllium, chrome, cobalt, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, or tungsten, wherein said the second layer includes a lithium, boron, carbon, nitrogen, oxygen, fluorine, silicon, aluminum, titanium, scandium, iron, germanium, lanthanum, magnesium, tungsten, strontium, yttrium, or zirconium.

Exposure apparatus

Growing community of inventors

Shioya-gun, Japan

Yutaka Watanabe