Ebara Corporation

Sony Corporation

Sumitomo Electric Industries, Limited

Adeka Corporation

Other

Jfe Steel Corporation

Dexerials Corporation

Yutaka Wada

Kazuto Hirokawa

Hisanori Matsuo

Tetsuji Togawa

Norio Kimura

Koichi Shigeno

Toru Takahashi

Hirokuni Hiyama

Tamami Takahashi

Toru Yano

Seiji Ishikawa

Masayoshi Hirose

Masatsugu Suwabe

Akira Ogata

Yoshimi Sasaki

Yoichi Kobayashi

Itsuki Kobata

Hiroto Kawaguchi

Tatsuya Sasaki

Shunsuke Nakai

Yoichi Shiokawa

Yoshihiro Mochizuki

Shinrou Ohta

Akira Fukuda

Keiji Oya

Tomohiko Akatsuka

Junko Shimada

Hiroshi Nakayama

Takayuki Saito

Yuji Kobayashi

Manabu Tsujimura

Kuniaki Yamaguchi

Naoaki Ogure

Toshifumi Hosoya

Yasuo Matsuda

Katsuya Nagayama

Noburu Shimizu

Mitsuo Arima

Takashi Itaya

Satoshi Wakabayashi

Yasushi Toma

Tsukuru Suzuki

Toshihiro Akimori

Hidetoshi Honda

Naohiro Takahashi

Kiyotaka Kawashima

Kazutomo Miyata

Takayoshi Kawamoto

Hiroshi Tabata

Ichiro Yoshimura

Hiroki Kanehira

Hiromitsu Watanabe

Masato Ishigaki

Akihiro Ooka

Koji Satoh

Hiroshi Akama

Yuichi Akai

Akira Kodera

Yukihiro Okada

Kouhei Obara

Yousuke Fujii

Hisamitsu Miyazaki

Seiyo Maekawa

Koji Narihara

Toshikazu Akita

A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.

Polishing method and polishing apparatus

A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (&#x221a;(a+b)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (&#x221a;(a+b)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of &#xb1;5% of filling rate at which chroma takes on minimum value.

Anti-reflective structure and method for designing same

A sensor apparatus includes a first member, a second member, and a detection mechanism. The second member is relatively movable in a first direction with respect to the first member. The detection mechanism includes an elastic member arranged between the first member and the second member, a support that is provided between the first member and the elastic member and forms an air layer between the first member and the elastic member, the air layer having a thickness changed by an elastic deformation of the elastic member, and an electrode pair that forms a plurality of capacitances including a capacitance component changed in accordance with a change of the thickness of the air layer. The detection mechanism outputs a detection signal on a movement amount of the second member in the first direction based on a change of a combined capacitance of the electrode pair.

Capacitive touchscreen sensor apparatus and display apparatus

A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.

Dressing method, method of determining dressing conditions, program for determining dressing conditions, and polishing apparatus

The present invention provides a steel plate quality assurance system and facilities thereof, wherein the steel plate quality assurance system measures, with a steel plate manufacturing line including a finishing mill of a steel plate manufacturing line, and accelerated cooling equipment disposed on the downstream side of the finishing mill in the advancing direction of the steel plate manufacturing line, temperature of at least the whole area of the upper surface of a steel plate, or the whole area of the lower surface of a steel plate to perform quality assurance, and includes temperature measurement means; temperature analysis means; and mechanical property determining means.

Steel plate quality assurance system and equipment thereof

A sensor apparatus includes: a display cover including an operation area that is pressed by an operator and a circumferential area located on the circumference of the operation area; a frame including an opening covered by the operation area and a fixing portion that fixes the circumferential area; a touch panel that is supported by the display cover to be positioned at the opening and detects a position at which the operator comes into contact with the operation area; and a pressure-sensitive sensor that is provided between the display cover and the frame, includes a first electrode and a second electrode opposed to the first electrode, and detects a pressing force with respect to the operation area based on a change of a capacitance between the first electrode and the second electrode that corresponds to a deflection amount of the display cover.

Sensor apparatus and electronic apparatus

A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

Sensor apparatus and information processing apparatus

An optical recording medium includes: an inorganic recording layer; and a protective layer including a composite oxide containing an indium oxide provided on at least one surface of the inorganic recording layer, wherein the composite oxide is represented by the formula [(InO)(A)], wherein A is cerium oxide or gallium oxide and X satisfies a range of 0.15&#x2266;X&#x2266;0.75.

Optical recording medium and manufacturing method thereof

A write-once optical recording medium includes an inorganic recording layer and a protective layer provided on at least one surface of the inorganic recording layer. This protective layer contains indium oxide and tin oxide as main components.

Write-once optical recording medium and process for manufacturing the same

Recording and reproducing characteristics and data saving reliability are secured in a write-once two-layer recording medium. A second recording layer from a side irradiated with light for recording and reproduction includes organic dye shown by a general formula of a chemical formula 3 described below (in the formula, R1 and R2 are alkyl groups of carbon number 1 to 4; Y1, Y2 respectively are organic groups independently; and X is Cl0, BF, PF, SbF), and organic dye shown by a general formula of a chemical formula 4 described below (in the formula, R1, R4 are alkyl groups of carbon number 1 to 4; R2, R3 are alkyl groups of carbon number 1 to 4 or groups forming 3 to 6 membered rings by being coupled; Y1, Y2 respectively are organic groups independently; and X is Cl0, BF, PF, SbF), to secure durability. 

Optical recording medium and method of manufacturing the same

Disclosed is to provide with an optical recording medium of a write-once type in which an excellent recording characteristic can be obtained over low speed recording to high speed recording. In an optical recording medium having a recording layer that contains an organic dye, the recording layer is configured to have at least an organic dye expressed by a general formula shown in the following chemical formula 1 (in this formula, R1 represents an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO, FB, PF, and SbF) and an organic dye expressed by a general formula shown in the following chemical formula 2 (in this formula, R1 and R4 represent an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO, FB, PF, and SbF). 

Optical recording medium and optical recording-reproducing method using thereof

An electrolytic processing apparatus can increase the efficiency of the dissociation reaction of water and efficiently perform electrolytic processing, and can eliminate the need for an operation of a change of ion exchanger. The electrolytic processing apparatus includes: a processing electrode and a feeding electrode; a liquid supply section for supplying a liquid containing an ion-exchange material between the workpiece and at least one of the processing electrode and the feeding electrode; a power source for applying a voltage between the processing electrode and the feeding electrode; and a drive section for moving the workpiece and at least one of the processing electrode and the feeding electrode relative to each other; wherein electrolytic processing of the workpiece is carried out while keeping the workpiece not in contact with but close to the processing electrode at a distance of not more than 10 &#x3bc;m.

Electrolytic processing apparatus and electrolytic processing method

A substrate polishing apparatus is used to polish a surface of a substrate such as a semiconductor wafer to a flat mirror finish. The substrate polishing apparatus has a polishing table and a polishing pad mounted on the polishing table for polishing a semiconductor substrate. The polishing pad has a through hole formed therein. The substrate polishing apparatus also has a light emission and reception device for emitting measurement light through the through hole formed in the polishing pad to the semiconductor substrate and receiving reflected light from the semiconductor substrate so as to measure a film on the semiconductor substrate. The light emission and reception device is disposed in the polishing table. The substrate polishing apparatus includes a supply passage for supplying a fluid to a path of the measurement light. The supply passage has an outlet portion detachably mounted on the polishing table. The substrate polishing apparatus also includes a protection cover mounted on the polishing table and fitted into the through hole when the polishing pad is attached to the polishing table.

Substrate polishing apparatus

An optical recording medium comprises a transmission substrate and a recording layer formed on the transmission substrate, the recording layer containing at least a dye material expressed by a general formula shown at the following chemical formula (in the chemical formula 1, R1 represents alkyl group having carbon numbers 1 to 4, R2, R3 represent alkyl group having carbon numbers 1 to 4, benzyl group or groups combined to form 3 to 6 rings, Y1 and Y2 independently represent organic groups and X represent ClO, BF, PF, SbF) and a dye material expressed by a general formula represented by the following chemical formula 2(in the chemical formula 2, R1 and R2 represent alkyl groups having carbon numbers 1 to 4, benzyl groups or groups combined to form 3 to 6 rings, Y1, Y2 independently represent organic groups and X represent ClO, BF, PF, SbF):  In a write once type optical recording medium such as DVD&#x2212;R and DVD+R, satisfactory recording characteristics can be obtained from low-speed recording to high-speed recording.

Optical recording medium

Growing community of inventors

Tokyo, Japan

Yutaka Wada