Asahi Kasei Kogyo Kabushiki Kaisha

Yutaka Usubuchi

Hirataka Itoh

Chisei Shibuya

Mitsuaki Akamine

Yoshio Suzuki

Masayoshi Mizuno

Hirokazu Fukumi

Katsuya Nakano

Takeshi Oguri

Koryo Itoh

Yakeshi Oguri

A sulfonic acid group-containing polyurethane produced from a sulfonic acid group-containing polyamide diol and/or a sulfonic acid group containing polyester diol, a dihydroxyhydrocarbon having a specific molecular weight and a diisocyanate. This polyurethane has not only high hydrophilicity but also excellent mechanical strength, excellent heat resistance, low permanent tensile set and low hardness, which are required for the base polymer for a photosensitive resin composition to be used for producing a flexographic printing plate. Further, a photosensitive resin composition containing such a sulfonic acid group-containing polyurethane has excellent photosensitivity and in addition, has excellent properties such that after the photosensitive resin composition has been exposed to actinic rays through an image-bearing transparency, the development of the exposed composition can be performed with water or an aqueous alkali solution. From this photosensitive resin composition, a flexographic printing plate having excellent printing resistance, ink resistance and mechanical properties can be obtained.

Sulfonic acid group-containing polyurethane and a photosensitive resin

(I) A photosensitive resin composition comprising

Thermoplastic elastomer and photosensitive resin composition based

A light-shielding screen comprising a light non-transmitting, photocured resin composition layer and a plurality of hollow portions having their respective upper and lower openings and passing through said composition layer, the hollow portions each having an inner wall extending from the circumference of each upper opening to the circumference of each lower opening substantially in parallel with the axis of said hollow portion. Such light-shielding screen is produced by image-wise exposing a layer of a photocurable resin composition to actinic radiation through an image-bearing transparancy to convert the layer to a modified layer having photocured portions and a plurality of uncured portions and then removing the uncured portions by means of a developer to form hollow portions passing through the modified layer and having their respective upper and lower openings. The present light-shielding screen can effectively shield extraneous light rays without deteriorating the image from an image-indicating device

Light-shielding screen and a process for producing the same

Novel cephalosporin derivatives having a higher antimicrobial activity across a broad antimicrobial spectrum. They are useful for treatment of infections caused by Gram-positive bacteria and Gram-negative bacteria. Such cephalosporin derivatives are prepared by a relatively simple method.

Cephalosporin derivatives and process for preparing the same

Novel cephalosporin derivatives having a higher microbial activity across a broad antimicrobial spectrum. They are useful for treatment of infections caused by Gram-positive bacteria and Gram-negative bacteria. Such cephalosporin derivatives are prepared by a relatively simple method.

An economically attractive process for industrial production of 4-aminomethyl cyclohexane carboxylic acid-1 in high purity and in high yield is provided. p-Amino benzoic acid is hydrogenated utilizing a ruthenium catalyst in the presence of a specific amount of alkali metal hydroxide. The resulting product is useful as the starting material for polymers or pharmaceuticals.

Growing community of inventors

Fuji, Japan

Yutaka Usubuchi