Hitachi High-Tech Corporation

Hitachi, Ltd.

Yutaka Okuyama

Takeshi Ohmori

Masaru Kurihara

Hyakka Nakada

Yasutaka Toyoda

Akira Kuriyama

Hisanori Matsumoto

Kohei Honkura

Pushe Zhao

A computer system providing a function for: extracting, from image data of a semiconductor pattern, coordinate information of a base point for measuring a dimension of a desired location of the semiconductor pattern; and measuring the dimension using the coordinate information of the base point. The computer system includes a training device in which a pose estimation model for outputting coordinate information of at least two base points as a training result is implemented. The training device is trained in advance using teacher data having the image data of the semiconductor pattern as an input and the coordinate information of at least two base points as an output, and extracts, for new image data input into the training device, the coordinate information of at least two base points and a dimension.

Computer system, dimension measurement method, and storage medium

A dimension measurement apparatus that automatically corrects a deviation of a contour without operator determination. The dimension measurement apparatus includes: a model learning unit that obtains a learning cross-sectional image and learning labels attached to different regions of the learning cross-sectional image and generates a deep learning model for image region division using the learning cross-sectional image and the learning labels; a model estimation unit that applies the model to a newly input target image and labels each independent region; a contour correction unit that detects a contour of each region using the target image and the labels, sets a representative point on the contour of the region, moves each representative point according to a movement rule, and repeats movement of the representative point until contour correction is complete; and a dimension measurement unit that measures a dimension of a device cross-sectional structure using the corrected contour.

Dimension measurement apparatus, semiconductor manufacturing apparatus, and semiconductor device manufacturing system

A model learning unit learns a prediction model on the basis of learning data, a target setting unit sets a target output parameter value by interpolating between a goal output parameter value and an output parameter value which is the closest to the goal output parameter value in output parameter values in the learning data, a processing condition search unit estimates input parameter values which corresponds to the goal output parameter value and the target output parameter value, a model learning unit updates the prediction model by using a set of the estimated input parameter value and an output parameter value which is a result of processing that a processing device performs as additional learning data.

Plasma processing apparatus including predictive control

A parameter compression unit compresses first input parameter values so that a parameter restoration unit can restore the first input parameter values, and generates first compressed input parameter values in which the number of control parameters is reduced, a model learning unit learns a prediction model from learning data that is a set of the first compressed input parameter values and first output parameter values that are processing results obtained by giving the first input parameter values, as a plurality of control parameters, to a processing device, and a processing condition search unit estimates a second compressed input parameter values corresponding to target output parameter values by using the prediction model.

Search device, search program, and plasma processing apparatus

Provided is a system that constructs a learning database for a learning model in a short period of time. The system generates an image in which a structure image is similar to an actual image by image processing of the structure image. One or more processors acquire a first structure image and a second structure image different from the first structure image. The one or more processors create a plurality of intermediate structure images indicating an intermediate structure between the first structure image and the second structure image. The one or more processors generate an image by making each of the plurality of intermediate structure images to be similar to an actual image by image processing of each of the plurality of intermediate structure images.

Image generation system

Search device, searching method, and plasma processing apparatus

The disclosure relates to a dimension measurement apparatus that reduces time required for dimension measurement and eliminates errors caused by an operator. Therefore, the dimension measurement apparatus uses a first image recognition model that extracts a boundary line between a processed structure and a background over the entire cross-sectional image and/or a boundary line of an interface between different kinds of materials, and a second image recognition that output information for dividing the boundary line extending over the entire cross-sectional image obtained from the first image recognition model for each unit pattern constituting a repetitive pattern, obtains coordinates of a plurality of feature points defined in advance for each unit pattern, and measures a dimension defined as a distance between two predetermined points of the plurality of feature points.

Dimension measurement apparatus, dimension measurement program, and semiconductor manufacturing system

A sensing system includes: a wireless sensor terminal that includes a sensor, a processor, and a memory; and a concentrator that includes a processor and a memory and is connected to the wireless sensor terminal. In the sensing system, the wireless sensor terminal includes a first signal processing unit that processes sensor data measured by the sensor, and a first wireless communication unit that transmits the data output by the first signal processing unit. The concentrator includes a second wireless communication unit that communicates with the first wireless communication unit, and a second signal processing unit that calculates a feature quantity based on the data received from the wireless sensor terminal, determines a principal component according to the feature quantity by a principal component analysis, and generates a principal component list corresponding to the principal component.

Sensing system, sensing method, and concentrator

To accurately determine a deterioration state of a secondary battery with respect to a practical current value. Provided are a state determination device of a secondary battery, a state determination method of a secondary battery, a secondary battery system, and a charge and discharge control apparatus having the state determination device. In the state determination device of the secondary battery having a positive electrode and a negative electrode, a capacity reduction parameter group A is determined based on charge and discharge characteristics per reference quantity of the positive electrode and the negative electrode and a current value A, and a resistance increase parameter group B is determined based on the charge and discharge characteristics per reference quantity of the positive electrode and the negative electrode, the capacity reduction parameter group A, and a current value B which is larger than the current value A.

Status determining method for secondary battery, status determining apparatus for secondary battery, secondary battery system, and charge/discharge control apparatus having status determining apparatus

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Tokyo, Japan

Yutaka Okuyama