Showa Denko K.k.

Toyota Jidosha Kabushiki Kaisha

Denso Corporation

Mirise Technologies Corporation

Qd Laser, Inc.

Showa Denko Kabushiki Kaisha

Yutaka Ohnishi

Hideo Miyata

Kohei Morikawa

Koichi Oyama

Yuki Kamata

Kenichi Nishi

Keizo Takemasa

Naoaki Misu

Toru Sasaki

Yoshimasa Ishimura

Kei Ohkubo

Shunichi Fukuzumi

Hiroyuki Monzen

Shinya Matsuhira

Kimitaka Ohshiro

Nobutake Mihara

Tetsuhiro Furukawa

Hiroyuki Tarumi

Toru Yoshida

Hitoshi Yamada

Muneyo Kihara

An optical semiconductor device includes an active layer having a plurality of quantum dot layers. The plurality of quantum dot layers include: a first quantum dot layer doped with a p-type impurity; and a second quantum dot layer doped with an n-type impurity and having an emission wavelength different from that of the first quantum dot layer.

Optical semiconductor device

In a semiconductor device, a quantum dot group includes a stack of plural quantum dot layers having different central wavelengths at which respective gains are maximum. A part of or all of the quantum dot layers are stacked so that the central wavelengths sequentially shifts along a stacking direction. The quantum dot group includes a longest wavelength layer group composed of some quantum dot layers including a longest wavelength layer having a longest central wavelength and at least one quantum dot layer stacked on the longest wavelength layer. The longest wavelength layer or the longest wavelength layer group has a larger gain at the central wavelength than the gain at the central wavelength of each of the other quantum dot layers.

Semiconductor device

There is provided a process for producing an aminomethyl group-containing benzamide compound represented by the general formula (II): wherein &#x2014;CONH2 and &#x2014;X represent a substituent on the benzene ring and &#x2014;CONH2 exists at the meta- or para-position of &#x2014;CH2NH2, and X and n are as defined below, which comprises hydrating an aminomethyl group-containing benzonitrile compound represented by the general formula (I): wherein &#x2014;CN and &#x2014;X represent a substituent on the benzene ring and &#x2014;CN exists at the meta- or para-position of &#x2014;CH2NH2, X represents a chlorine atom or a fluorine atom, and n represents an integer of 0 to 4, provided that, when n is 2 or more, X may be the same or different 

Production process of aminomethyl group-containing benzamide compound

Photooxidation catalyst and production process for aldehyde derivatives

The present invention relates to a process by a series of reactions using tetrafluorocyanobenzens as material for producing tetrafluorobenzenemethanols, tetrafluorobenzenecarbaldehyde dialkylacetals and tetrafluorobenzenecarbaldehydes in a high purity and a high yield which are useful as intermediates in the production of cyclopropanecarboxylic acid esters having insecticidal action, and also relates to a novel tetrafluorobenzenecarbaldehyde dimethylacetal.

Process for producing tetrafluorobenzenemethanols

A method for producing an isocyanatoalkyl (meth)acrylate substantially free of hydrolyzable chloride, comprising adding an amine and/or an imidazole and an epoxy group-containing compound and then purifying by distillation the isocyanatoalkyl (meth)acrylate until a 2-chloropropionic acid isocyanatoalkyl ester of an isocyanatoalkyl acrylate or a 2-methyl-2-chloropropionic acid isocyanatoalkyl ester of an isocyanatoalkyl methacrylate is substantially eliminated.

Method for producing isocyanatoalkyl (meth)acrylate

A benzopyran derivative represented by formula (I): ##STR1## wherein R.sub.0 represents an alkyl or alkenyl group having 10 to 20 carbon atoms, R.sub.1 to R.sub.3 each represent a methyl group or a hydrogen atom, and G represents a --CH.sub.2 CH(OH)CH.sub.2 OH or --CH(CH.sub.2 OH).sub.2 group; or a salt thereof, which has a high water-solubility and thus is usable in cosmetics.

Benzopyran derivative, method for producing the same and use thereof

Growing community of inventors

Kawasaki, Japan

Yutaka Ohnishi