Agency of Industrial Science and Technology

Jeol Ltd.

Other

Kishimoto Sangyo Co., Ltd.

Director-general of Agency of Industrial Science and Technology

Otsuka Chemical Co., Ltd.

Toyonobu Yoshida

Yutaka Koinuma

Hideo Ohuchi

Koichi Mizuno

Reiji Aizawa

Satoshi Kushiyama

Shoji Hirakawa

Yoshiro Kubota

Takanobu Amano

Takeshige Wakabayashi

Hisashi Komaki

Satoru Kobayashi

Takashi Yata

Satoru Kabayashi

Kazunori Fukumura

Shigeki Terayama

Takeru Ohgushi

Yoshihito Fukumura

The invention provides a nontoxic, undangerous resist residue remover that enables removal of resist residues to be carried out without metal corrosion or other problems and with safety. The remover is an aqueous solution containing ammonium phosphate and/or condensed ammonium phosphate and having a pH ranging from 1 to 10.

Resist residue remover

Detergent for processes for producing semiconductor devices or producing

A halogenated organic compound is introduced into a plasma. In the plasma state, substances are very reactive and chemical substances which are not readily decomposed such as halogenated organic compounds are decomposed in a short time. Specifically, in a high-temperature plasma exceeding 10,000.degree. C., almost all molecules are considered to dissociate into atoms. A reactive substance such as water is introduced into a plasma together with a halogenated organic compound. The decomposed halogenated organic compound is caused to react with the reactive substance, for preventing the decomposed organic compound from returning to its original state.

Apparatus for decomposing halogenated organic compound

A mixed gas is contacted with a non-carbonaceous adsorbent while irradiating the adsorbent with an electromagnetic wave having a frequency of 1 MHz to 25 GHz, such as a microwave, so that a gas component having a smaller coefficient of dielectric loss is selectively adsorbed by the adsorbent. A gas adsorbed on an adsorbent may be desorbed therefrom by contact with a desorbing gas while irradiating the adsorbent with the above electromagnetic wave.

Gas adsorption and desorption method

Method and apparatus for decomposing halogenated organic compound

Growing community of inventors

Ibaraki, Japan

Yutaka Koinuma