Fuji Photo Film Company, Limited

Fujifilm Corporation

Yutaka Adegawa

Koji Shirakawa

Toshiaki Aoai

Shoichiro Yasunami

Morio Yagihara

Kentaro Shiratsuchi

Kensuke Morita

Kunihiko Kodama

Kenichiro Sato

Ippei Nakamura

Katsuyuki Watanabe

Kazuya Uenishi

Rikio Inoue

Yu Naito

Masato Nagura

Yoshiaki Hisakado

Akira Asano

A film of 15 to 45 &#x3bc;m thick containing a cellulose acylate and an aromatic ester oligomer having a repeating unit derived from a dicarboxylic acid and a repeating unit derived from a diol, in which the repeating unit derived from a dicarboxylic acid has a ratio m/n of from 0/10 to 3/7, m and n represent a molar proportion of a repeating unit derived from an aliphatic dicarboxylic acid and an aromatic dicarboxylic acid, respectively, and the film satisfies |Rth(590)|&#x2264;50 nm; has a good appearance and is free of deterioration in display performance when the film with a thin thickness is produced in the form of a roll, achieves a high pencil hardness by imparting a high Knoop hardness to the film, even with a hard coat layer provided, and is free of display unevenness on installing the film in a liquid crystal display device.

Optical film, polarizing plate, and image display device

An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.

Insulating film, process for producing the same and electronic device using the same

A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.

Film-forming composition, insulating material-forming composition, insulating film and electronic device

A composition for forming an insulating film comprising at least one of a compound represented by formula (I), a hydrolysate of the compound represented by formula (I) and a condensate of the compound represented by formula (I): wherein Rto Reach independently represents an organic group, and Rto Rare the same or different. And an insulating film obtained by a process, the process comprising using the compound represented by formula (I) as a starting material.

Composition for forming insulating film and process for producing insulating film

A polymer having a repeating unit represented by formula (I) is used for an insulating-film forming material and an insulating film. wherein Rto Reach are a monovalent hydrocarbon group, etc.; one of X, Y and Z is a specific siloxane group and the remaining two each are &#x2014;O&#x2014; or divalent silyl-containing group that bonds to (I) on the side of the oxygen atom of the group.

Insulating-film forming material and insulating film using the same

An intermediate layer composition having a silicon-containing polymer(A) having a specific structure and a pattern-forming process using the same.

Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate

An insulating-film forming material comprising a resin (A) that has a structure represented by formula (I): wherein Y, Y, Arand Arare the same or different; each of Y, Y, Arand Arrepresents an aromatic ring-containing divalent organic group; at least one of Yand Yis a divalent aromatic polycyclic group having a specific structure; m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100.

A positive resist composition comprising (A) a resin having a specific structure and capable of decomposing under action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

Positive resist composition

A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.

Negative-working resist composition for electron beams or x-rays

A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B&prime;) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B&prime;) by the action of an acid are disclosed.

Electron beam or X-ray negative-working resist composition

Positive photoresist composition for far ultraviolet exposure

A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.

Negative resist composition

A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.

A positive resist composition comprises: a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray; or a cyclic ether compound.

A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:

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Shizuoka, Japan

Yutaka Adegawa