Toyo Gosei Co., Ltd.

Yusuke Suga

Satoshi Enomoto

An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.

Composition and method for manufacturing device using same

A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

Compounders for enhancing generation of chemical species

A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. Also described is a method for manufacturing a device, the method including applying a liquid containing a composition to a member such that a coating film including the composition is formed on the member; and exposing the coating film to at least one of a first electromagnetic ray and a first particle ray such that a first portion of the coating film is exposed to the at least one of the first electromagnetic ray and the first particle ray while a second portion of the coating film is not exposed to the at least one of the first electromagnetic ray and the first particle ray.

Growing community of inventors

Chiba, Japan

Yusuke Suga