Kioxia Corporation

Yusuke Kondo

Soichi Yamazaki

Kei Watanabe

Toshiyuki Sasaki

Mitsuhiro Omura

Yuya Matsubara

Junichi Hashimoto

Kosuke Horibe

Takehiro Kondoh

Kaori Narumiya

Junya Fujita

A film forming apparatus includes an electrode, a target holder configured to hold a film forming target so as to face the electrode, and a masking shield holder configured to hold a masking shield between the electrode and the target holder. The masking shield includes a lattice portion having a plurality of openings therein and a frame portion supporting the lattice portion.

Film formation apparatus, film formation method, and method for fabricating semiconductor device

According to one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes forming a second film on the first film. The method further includes forming a recess in the first film using the second film as a mask. The second film includes a first layer having carbon and a second layer having carbon formed on the first layer. The second layer has a second carbon density lower than a first carbon density of the first layer.

Manufacturing method of semiconductor device

Growing community of inventors

Yokkaichi Mie, Japan

Yusuke Kondo