Sanyo Chemical Industries, Ltd.

Mori Seiki Co., Ltd.

Toray Opelontex Co., Ltd.

Yusuke Koike

Toshihiro Tanaka

Iwao Yamaji

Shingo Ito

Daisuke Kono

Hiroshi Takayama

Atsushi Matsubara

Shinpei Funaoka

Kenzo Hori

The present invention relates to a polyurethane resin including, as constituent units, a diol (a1) having a number average molecular weight of 500 to 10,000, an organic diisocyanate (b), and a chain extender (a2). The total concentration of urethane groups and urea groups in the polyurethane resin is 1.25 to 2.50 mmol/g based on the weight of the polyurethane resin. Hard segment domains of the polyurethane resin have an average domain size of 20 to 30 nm as measured with an atomic force microscope.

Polyurethane resin, polyurethane resin composition, and method for manufacturing polyurethane resin

A reference mirroris disposed on a table, a first laser displacement sensor Lfor measuring a machined surface of a workpiece W and a second laser displacement sensor Lfor measuring a reference surface of the reference mirrorare disposed to a tool holder. A measurement motion applying sectioncauses the tableand the tool holderto relatively move in a sinusoidal trajectory, and a sensitivity calculating sectioncalculates sensitivity of the first laser displacement sensor Lbased on machined-surface displacement data and reference-surface displacement data which are measured during the relative movement. Subsequently, an actual shape data calculating sectioncorrects the machined-surface displacement data based on the calculated sensitivity, and calculates actual shape data of the machined surface by taking the difference between the corrected machined-surface displacement data and the reference-surface displacement data.

On-machine measurement method and measurement apparatus

Growing community of inventors

Kyoto, Japan

Yusuke Koike