Central Glass Company, Limited

Yusuke Kanto

Takashi Mori

Haruhiko Komoriya

Shinichi Sumida

Kenjin Inomiya

Takamasa Kitamoto

Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, Rrepresents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). Rand Reach independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure. 

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, Rrepresents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and Ror Rrepresents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

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Fujimino, Japan

Yusuke Kanto