Gigaphoton Inc.

Yusuke Hoshino

Toshihiro Nishisaka

Yukio Watanabe

Atsushi Ueda

Koichiro Koge

Takayuki Osanai

Kouichiro Kouge

Gouta Niimi

Takashi Okada

An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.

Extreme ultraviolet light generation apparatus and electronic device manufacturing method

An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.

EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method

Growing community of inventors

Oyama, Japan

Yusuke Hoshino