Sumitomo Chemical Company, Limited

Yusuke Fuji

Ichiki Takemoto

Nobuo Ando

Takayuki Miyagawa

Mitsuhiro Hata

Koji Ichikawa

Satoshi Yamaguchi

Yoshiyuki Takata

Junji Shigematsu

Isao Yoshida

A resin containing a structural unit derived from a compound represented by the formula (aa) 

Resin and resist composition

The present invention provides a chemically amplified resist composition comprising:

Chemically amplified positive resist composition

A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II).  wherein Xrepresents a hydrogen atom, a Cto Calkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, Rto Rindependently represent a hydrogen atom, an alkyl group, etc., and Arepresents an organic counterion, Erepresents CFSO&#x2014;, CFSO&#x2014;, CFSO&#x2014;, etc., Yand Yindependently represent a fluorine atom or a Cto Cperfluoroalkyl group.

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

A polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein Rrepresents a hydrogen atom etc., Rrepresents a linear, branched chain or cyclic C1-C8 alkyl group, Rrepresents a methyl group, n represents an integer of 0 to 14, Zrepresents a single bond etc., k represents an integer of 1 to 4, Rand Reach independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein Rand Reach independently represents a hydrogen atom etc., Rrepresents a methyl group, Rrepresents a hydrogen atom etc., n' represents an integer of 0 to 12, Zrepresents a single bond etc., k&#x2032; represents an integer of 1 to 4, Rand Reach independently represents a hydrogen atom etc., and Rrepresents a C1-C30 monovalent hydrocarbon group, andat least one structural unit selected from the group consisting of structural units represented by the formulae (IIIa), (IIIb), (IIIc), (IIId) and (IIIf) wherein Rrepresents a hydrogen atom etc., Rrepresents a methyl group, Ris independently in each occurrence a carboxyl group etc., j represents an integer of 0 to 3, a represents an integer of 0 to 5, b represents an integer of 0 to 3, c represents an integer of 0 to (2+2), Zrepresents a single bond etc., and k&#x2033; represents an integer of 1 to 4.

Polymer and chemically amplified resist composition comprising the same

The present invention provides a polymer containing a structural unit represented by the formula (Ia) or (Ib): wherein R, R, R, n, Z, R, Rand m are defined in the specification, a structural unit represented by the formula (II): wherein R, R, R, R, Z, n' and Z&#x2032; are defined in the specification, and a structural unit represented by the formula (III): wherein R, R, 1&#x2032; and Zare defined in the specification.

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or &#x2014;[CH]&#x2014;COO&#x2014;, and

Chemically amplified resist composition

A resin which comprises (1) at least one structural unit selected from the group consisting of a structural unit derived from 3-hydroxy-1-adamantyl (meth)acrylate, a structural unit derived from 3,5-dihydroxy-1-adamantyl (meth)acrylate, a structural unit derived from (meth)acryloyloxy-&#x3b3;-butyrolactone having a lactone ring optionally substituted by alkyl, a structural unit of the formula (Ia) and a structural unit of the formula and (2) a structural unit of the formula (II) and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and also provides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.

Growing community of inventors

Ibaraki, Japan

Yusuke Fuji