Jsr Corporation

Thk Co., Ltd.

Yusuke Asano

Yuki Hayashi

Yuki Tanaka

Akihiro Unno

Tomofumi Ohashi

Mitsuo Sato

Katsunori Kogure

Hiromitsu Nakashima

Hisashi Nakagawa

Shinya Minegishi

Takakazu Kimoto

Shinji Aoki

Hiroshi Tomioka

Toru Kimura

Tomoki Nagai

Yukio Nishimura

Hiroyuki Takizawa

Takehiko Naruoka

Tetsuhiro Nishide

Masafumi Hori

Takeshi Ishii

Takuya Horie

Hitoshi Osaki

Takanori Kawakami

Kazuo Nakahara

Kazuki Kasahara

Masafumi Yoshida

Hiromu Miyata

Reiko Kimura

Akimasa Soyano

Yoshifumi Oizumi

Tomohiro Kakizawa

Shin-ichi Nakamura

Yuta Tsujisawa

Tomonori Futai

Yuko Kiridoshi

Provided is a mounting member that allows a sensor such as a vibration sensor to be reliably and easily mounted to a moving member such as a nut of a motion guidance apparatus without need of removing the motion guidance apparatus from equipment, and without need of post-processing even when a motion guidance apparatus such as a ball screw is already mounted to the equipment, and a motion guidance apparatus including this mounting member. A mounting member for mounting a sensor to a motion guidance apparatus having a shaft member extending in a longitudinal direction and a moving member that is mounted so as to be movable along the longitudinal direction with respect to the shaft member, the mounting member including: a fixing portion that can be fixed to a fastening hole formed in the moving member; and a sensor mounting portion to which the sensor is mounted.

Mounting member and motion guidance apparatus including the mounting member

A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Arrepresents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; Rrepresents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3. 

Radiation-sensitive composition and resist pattern-forming method

A lifespan diagnosis device for a motion guidance device including: a stress calculating means which calculates stresses during movement for each of virtual segments, the stresses during movement being stresses that occur in each segment during a movement of the moving member; a counting means which counts, for each of the segments, on the basis of the amount of displacement, the number of occurrences of the stresses during movement which repetitively occur with waving during a movement of the moving member along the track; and a diagnostic means which calculates, for each of the segments, a lifespan exhaustion ratio on the basis of magnitudes of the stresses during movement and the number of occurrences of the stresses during movement, and which diagnoses the lifespan of the motion guidance device on the basis of the calculated lifespan exhaustion ratios of the respective segments.

Lifespan diagnosis device, method, non-transitory storage medium, and system for motion guidance device

A machining control system for machining of a workpiece movably supported by a motion guidance device having a track member which extends along a longitudinal direction and a moving member which is arranged so as to oppose the track member via a rolling element being rollably arranged inside a rolling groove and which is relatively movable along the longitudinal direction of the track member, the machining control system including: an acquisition unit which acquires prescribed machining information related to a load applied to the motion guidance device when machining of the workpiece is performed by the machining device; and an output unit which generates machining correction information for correcting a prescribed control parameter for machining of the workpiece by the machining device on the basis of the prescribed machining information acquired by the acquisition unit and which outputs the generated machining correction information to a side of the machining device.

Machining control system and motion guidance device

A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.

Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof

Provided is a motion guide device load measuring system that can accurately measure loads acting on a motion guide device in use. The load measuring system includes a position detecting unit () for detecting the position of a sliding member () relative to a track member () in a direction of relative movement, and at least one sensor (--) for detecting the relative displacement of the sliding member () relative to the track member () in a radial direction and/or a horizontal direction. A calculating unit () calculates loads acting on the motion guide device (), in association with the position of the sliding member (), on the basis of position information detected by the position detecting unit () and displacement information detected by one or more of the sensors (--).

Motion guide device load measuring system and load measuring method, and motion guide device service life calculating method

To suitably set a control gain in feedback control while suppressing an increase in apparatus size. A workpiece transport control system includes: one or a plurality of motion guidance devices; a table on which a workpiece is to be placed; an actuator which imparts a driving force to the table; a control unit which performs transport control by feedback control; and a calculation unit which calculates a transport load applied from the workpiece to a moving member of each of the one or a plurality of motion guidance devices, wherein a control gain related to the feedback control in the transport control is adjusted on the basis of the transport load in each of the one or a plurality of motion guidance devices.

Workpiece transport control system and motion guidance device

In a management system which manages user equipment installed in a prescribed space managed by a user, the user equipment including a plurality of motion guidance devices each including a track member, a moving member, and a plurality of displacement sensors which detect displacements of the moving member in a prescribed number of displacement directions in the moving member, on the basis of lifespan-related information corresponding to each of the plurality of motion guidance devices, a lifespan exhaustion ratio of each motion guidance device is calculated and, on the basis of the calculated lifespan exhaustion ratio, replacement object devices to be replaced within a prescribed period which constitute a part of or all of the plurality of motion guidance devices are determined. In addition, a user is notified of a replacement timing at which all of the determined replacement object devices in the user equipment are to be replaced.

Management system and motion guidance device

A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer. 

Radiation-sensitive resin composition, polymer and method for forming a resist pattern

The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO, wherein a hydrogen atom or an electron-donating group bonds to an &#x3b1; carbon atom with respect to SO, and an electron-withdrawing group bonds to a &#x3b2; carbon atom with respect to SO; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), Rand Reach independently represent a hydrogen atom or a monovalent electron-donating group. Rrepresent a monovalent electron-withdrawing group. Rrepresents a hydrogen atom or a monovalent hydrocarbon group. 

Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator. 

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), Rrepresents a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), Ris as defined in the above formula (1). X represents an electron attractive group. Rrepresents a monovalent organic group having 1 to 20 carbon atoms. 

Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound

A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.

Resist composition, resist pattern-forming method, and resist solvent

A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film.

Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator. 

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Tokyo, Japan

Yusuke Asano