Samsung Sdi Co., Inc.

Yushin Park

Sunghwan Kim

Seunghyun Kim

Hyeonil Jung

Jaebum Lim

Sunyoung Yang

Taeho Kim

Hyungseok Park

A polymer, an organic layer composition including the polymer, and a method of forming a pattern using the organic layer composition, the polymer including a reaction product of a first compound represented by Chemical Formula 1 and a second compound represented by Chemical Formula 2:(CHO)&#x2014;Ar&#x2014;X&#x2014;Ar&#x2014;(CHO)&#x2003;&#x2003;[Chemical Formula 1]

Polymer, organic layer composition and method of forming patterns

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a compound represented by Chemical Formula 1,  

Hardmask composition, hardmask layer and method of forming patterns

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1, 

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

Disclosed are a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, an organic layer composition including the polymer, and a method of forming patterns using the organic layer composition.  The Chemical Formulae 1 and 2 are the same as defined in the specification.

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Suwon-si, South Korea

Yushin Park