Fujitsu Corporation

Yusei Miyazono

Kazuhiko Sumi

Masahiro Uraguchi

A resist developing apparatus has a plurality of developing solution containers each provided with a temperature regulator, a mixture tank connected to the plurality of developing solution containers, a flow control valve connected between the mixture tank and each developing solution container, a temperature detector for detecting the temperature of developing solution in the mixture tank, and a control system for controlling the flow control valve in accordance with the temperature detected by the temperature detector. As the development progresses, the temperature of the developing solution is lowered to stop the development. Thereafter, the developing solution is supplanted by rinsing solution.

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Kawasaki, Japan

Yusei Miyazono