San-apro Limited

Tokyo Ohka Kogyo Co., Ltd.

Yusaku Takashima

Noriya Fukunaga

Yoshiyuki Utsumi

Yoshitaka Komuro

Takuya Ikeda

Issei Suzuki

Toshiaki Hato

Takaaki Kaiho

Takeshi Furuta

Takuto Nakao

Hideo Seike

The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represented by general formula (1). In formula (1), R represents an alkyl group or an aryl group; substituents, R1 to R5, each independently represent an alkyl group, a hydroxy group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom; R6 to R9 each independently represent an alkyl group, an aryl group, or a hydrogen atom; mto meach represent the number of occurrences of each of R1 to R5, mand mrepresent an integer of 0 to 3, mand mrepresent an integer of 0 to 4, mrepresents an integer of 0 to 5, and Xrepresents a monovalent polyatomic anion.

Sulfonium salt, photoacid generator, curable composition, and resist composition

The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same. 

Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof

A sulfonium salt is formed of a sulfonium cation selected from a group indicated by general formulas (1), (2), and (3) and a gallate anion represented by formula (a). A photoacid generator is characterized in that said sulfonium salt is contained therein. An energy-ray curable composition contains the acid generator and a cationic polymerizable compound. A cured product is formed by curing these substances. 

Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof

Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. wherein Rrepresents an electron withdrawing group; Rand Reach independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and Xrepresents a monovalent counter anion.

Sulfonium salt and photo-acid generator

Growing community of inventors

Kyoto, Japan

Yusaku Takashima