Isteq B.v.

Rnd-Isan. Ltd

Isteq Group Holding B.v.

Ooo “Isteq B.v.”

Yury Viktorovich Sidelnikov

Vladimir Mikhailovich Krivtsun

Konstantin Nikolaevich Koshelev

Aleksandr Andreevich Lash

Vladimir Vitalievich Ivanov

Oleg Feliksovich Yakushev

Aleksandr Yurievich Vinokhodov

Vyacheslav Valerievich Medvedev

Mikhail Sergeyevich Krivokorytov

Samir Ellwi

Oleg Borisovich Khristoforov

Denis Aleksandrovich Glushkov

Denis Alexandrovich Glushkov

Pavel Stanislavovich Antsiferov

Mikhail Sergeyevich Kryvokorytov

Pavel Viktorovich Seroglazov

An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

X-ray source with rotating liquid-metal target

A radiation source contains a collector module comprising an optical collector, positioned in a vacuum chamber with an emitting plasma, further comprising a means for debris mitigation which include at least two casings arranged to output debris-free homocentric beams of the short-wavelength radiation, coming to the optical collector preferably consisting of several identical mirrors. Outside each casing there are permanent magnets that create a magnetic field inside the casings to mitigate charged fraction of debris particles and provide the debris-free homocentric beams of short-wavelength radiation. Other debris mitigating techniques are additionally used. Preferably the plasma is laser-produced plasma of a liquid metal target supplied by a rotating target assembly to a focus area of a laser beam. The technical result of the invention is the creation of high-powerful high-brightness debris-free sources of short-wavelength radiation with large, preferably more than 0.25 sr, collection solid angle.

Short-wavelength radiation source with multisectional collector module and method of collecting radiation

Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45&#xb0; to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.

High brightness laser-produced plasma light source

High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber () with an input window () for a laser beam () focused into the interaction zone (), an output window () for the exit of the short-wavelength radiation beam (); the rotating target assembly (), having an annular groove (); the target () as a layer of a molten metal formed by centrifugal force on the surface of the distal wall () of the annular groove () while the proximal wall () of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.

High-brightness laser produced plasma source and methods for generating radiation and mitigating debris

High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.

High brightness short-wavelength radiation source (variants)

The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180&#xb0; C. may be adjusted around the target jet.

High-brightness LPP EUV light source

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Moscow, Russia

Yury Viktorovich Sidelnikov