Osmic, Inc.

Rigaku Corporation

Rigaku Innovative Technologies, Inc.

Rigaku Industrial Corporation

Osmo, Inc.

Yuriy Platonov

Boris Verman

Kazuhiko Omote

Licai Jiang

Vladimir V Martynov

Shuichi Kato

Tetsuya Ozawa

Masahiro Nonoguchi

Takeshi Osakabe

Tsutomu Tada

Makoto Kambe

Hajime Fujimura

Karsten Joensen

Kazuaki Shimizu

Srivatsan Seshardi

Toshifumi Higuchi

Raita Hirose

Srivatsan Seshadri

An imaging type X-ray microscope capable of enlarging a numerical aperture even with high energy X-rays and acquiring a magnified image with sufficient intensity even in a laboratory. The imaging type X-ray microscope comprises an X-ray irradiation unit having a microfocal and high-power X-ray source and a condenser mirror for focusing and irradiating the emitted X-rays toward a sample, a sample holding unit for holding the sample, a reflecting mirror type X-ray lens unit for imaging X-rays transmitted through the sample, and an imaging unit for acquiring the imaged X-ray image, wherein each mirror constituting the condenser mirror and the reflecting mirror type X-ray lens unit has a reflecting surface formed with a multilayer film having a high reflectivity in X-rays of a specific wavelength.

Imaging type X-ray microscope

Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

Total reflection x-ray fluorescence spectrometer

Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

X-ray diffractometer with multilayer reflection-type monochromator

An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.

Multiconfiguration X-ray optical system

The present invention provides a multilayer structure including a substrate having formed on a surface thereof at least one period of individual layers, the period having at least two layers including a first layer which includes magnesium silicide and a second layer which includes at least one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, alloys, oxides, borides, silicides, and nitrides of these elements, silicon, carbon, silicon carbide, boron, and boron carbide. If the period includes three layers, the second layer includes one of silicon, carbon, silicon carbide, boron, and boron carbide and a third layer includes one of tungsten, tantalum, cobalt, nickel, copper, iron, chromium, and alloys, oxides, borides, silicides, and nitrides of these elements, the second layer being disposed between the first and the third layers. If the period includes four layers, a fourth layer includes one of silicon, carbon, silicon carbide, boron, and boron carbide, the third layer being disposed between the second and fourth layers, and the fourth layer being disposed between the third layer of multilayer period n and the first layer of multilayer period n&#x2212;1.

Magnesium silicide-based multilayer x-ray fluorescence analyzers

A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Multi-layer structure with variable bandpass for monochromatization and spectroscopy

An analyzer that includes a first multilayer structure, a spacer material deposited on the first multilayer structure and a second multilayer structure deposited on the spacer material.

X-ray phase contrast imaging using a fabry-perot interferometer concept

The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n&minus;1.

Method and apparatus for detecting boron in x-ray fluorescence spectroscopy

An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.

Growing community of inventors

Troy, MI, United States of America

Yuriy Platonov