United Technologies Corporation

Yuriy G Kononenko

Igor V Belousov

Anatoly Kuzmichev

John F Mullooly, Jr

Vadim Ivanovich Bondarchuk

Michael J Maloney

Richard S Mullin

Oleg G Pankov

Carl R Soderberg

Dmitriy Ryzhikov

Leonid Shaginyan

Andrii Marynskyi

Jr John F Mullooly

Jr John E Mullooly

A method to limit surface zone recrystallization in a superalloy article includes limiting recrystallization in a surface zone of a superalloy article by treating the superalloy article in an oxygen-containing environment to introduce oxygen into the surface zone in an amount sufficient to pin any new grain boundaries in the surface zone.

Method for limiting surface recrystallization

An apparatus for depositing a coating on one or more parts () has: a chamber (); a part holder () for carrying the part(s); a bias voltage source () coupled to the part(s) to apply a bias voltage to the part(s); a source () of the coating material; a plurality of temperature sensors (); and a plurality of leads () passing outputs of the temperature sensors out from the chamber. A temperature monitoring system () has a temperature data processor (). At least one fiber optic link () couples the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage.

Deposition substrate temperature and monitoring

A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution.

Thermal barrier coatings and methods of application

A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm.

Ceramic coating deposition

A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps.

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Kyiv, Ukraine

Yuriy G Kononenko