Multimetrixs LLC

Other

Yuri Vorobyev

Leonid Velikov

Boris Kesil

Ali Sadeghi

Gene Kristul

Elik Gershenzon

The propose method of manufacturing a solid-state lithium battery consists of preparing an anode coated with a solid-state electrolyte precursor and a cathode unit coated with solid-state electrolyte, both precursors containing a predetermined amount of a redundant water. The thus prepared anode unit and cathode unit are pressed to each other through their respective electrolyte precursor layers in a closed chamber at a predetermined elevated temperature and under a predetermined mechanical pressure, whereby an integral pre-final solid-state battery unit is formed. The manufacture of the battery is completed by inserting the prefinal product into a casing that leaves parts of the metal current collectors of the prefinal product exposed for use as a battery anode and a battery cathode.

Method of manufacturing a solid-state lithium battery and a battery manufactured by the method

Proposed is a method of synthesizing a solid-state electrolyte of LiHalO formula for use in a lithium-ion battery. The method consists of uniformly mixing at least LiOH and LiHal in a stoichiometric quantities, heating the prepared mixture to a melting temperature and causing a reaction of formula (2LiOH+LiHal=LiHalO+HO) between the at least LiOH and LiHal in a process free of forming a perovskite structure and at a temperature, at which HO that forms at the aforementioned reaction is converted into a bound form, whereby a reaction product is obtained. According to another modification of the method, prior to the stage of melting the mixture, a reinforcement mesh is immersed into the mixture, whereby after mixture is solidified, a solid-state electrolyte reinforced with the mixture embedded into its material is obtained.

Method of synthesizing a solid-state electrolyte for use in a lithium-ion battery

An apparatus for measuring thickness in super-thin films consists of a special resonator unit in the form of an open-bottom cylinder which is connected to a microwave swept frequency microwave source via a decoupler and a matching unit installed in a waveguide that connects the resonator unit with the microwave source. The apparatus operates on the principle that thin metal film F, the thickness of which is to be measured, does not contact the end face of the open bottom of the cylindrical resonator sensor unit and functions as a bottom of the cylindrical body. The design of the resonator excludes generation of modes other than the resonance mode and provides the highest possible Q-factor. As the conductivity directly related to the film thickness, it is understood that measurement of the film thickness is reduced to measurement of the resonance peak amplitudes. This means that superhigh accuracy inherent in measurement of the resonance peaks is directly applicable to the measurement of the film thickness or film thickness deviations.

Method and apparatus for precision measurement of film thickness

The system of the invention for measuring characteristics of thin conductive and non-conductive material, such as bulk material or films, is based on the use of a resonance oscillating circuit that incorporates at least two components selected from the group consisting of an inductive coil and a capacitor, which in combination form a sensor that could be approached close to the surface to be measured. The measurement of the film or material characteristics, such as film resistance (film thickness) or a dielectric constant (film thickness) of a non-conductive material, is based on the principle that the sensor is approached to the measured surface at a distance, at which the inductance and capacitance of the sensor generate in the measured material a virtual coil and an additional capacitance, which strongly depend on the characteristics of the measured material. As the sensor approached towards the surface to be measured, the sensor-material system generates a series of resonances having different values of power. One of these resonances can be defined as the so-called full resonance, which is characterized by the maximum value of the power, and hence provides the most accurate measurement and can be used for precisely determining the measurement distance. By comparing the results of measurements with those known from measuring the precalibrated films or materials under the same conditions, it becomes possible to determine the target characteristics of the films or materials.

System and method for measuring characteristics of materials with the use of a composite sensor

An apparatus of the invention is intended for multiple identical continuous records of characteristics on the surface of an object, e.g., a semiconductor wafer, after selected stages of manufacture and treatment. The apparatus is provided with a rotary table for rotation of the wafer with a mechanism for installing the wafer in a predetermined initial position for starting measurements from the same point after each selected stage of manufacture or treatment. The measurements are synchronized for all sequential manufacturing stages of the wafer and are carried out with the use of a resonance sensor based on the principles of resonance sensor technology. The recorded information is stored on a memory device, and if the final product has a defect or deviations, the stored information can be easily retrieved for revealing the time, place on the product, and the source of the defect. The same records can also be used for correlation between the defects or deviations and the failure of the final product on quality control and even during exploitation of the chip in a semiconductor device.

Apparatus and method for multiple identical continuous records of characteristics on the surface of an object after selected stages of manufacture and treatment

The invention relates to an apparatus and method for measuring thickness and deviations from the thickness of very thin conductive coatings on various non-conductive substrates, or of very thin non-conductive coatings on conductive substrates. The apparatus consists of an inductive coil having specific parameters, an external AC generator operating on frequencies, e.g., from 50 MHz to 2.5 GHz, preferably from 100 MHz to 200 MHz, and a measuring instrument, such as an oscilloscope, voltmeter, etc. for measuring output of the sensor. The coil has miniature dimensions. The invention is based on the principle that inductive coil of the sensor, active resistance of the coil winding, inherent capacitance of the inductive coil (or a separate capacitor built into the sensor's circuit), and the aforementioned AC generator form a parallel oscillating circuit. The apparatus operates on very high resonance frequencies, preferably within the range of 100 to 200 MHz, at which a capacitive coupling is established between the coil of the oscillating circuit and the thin films being measured. By measuring the parameters of the resonance oscillating circuit, it becomes possible to measure film thickness below 500 Angstroms.

Method and apparatus for measuring thickness of thin films with improved accuracy

A universal electromagnetic resonance system is aimed at detecting and measuring local non-uniformities in objects made from conductive or non-conductive materials. The system comprises a composite measuring unit composed of two identical and symmetrically arranged individual oscillation circuits with measurement elements in the form of identical and symmetrically arranged inductive coils or capacitor chips. The unit is connected to an impedance analyzer for supplying RF current and for measuring the voltage signal in the oscillation circuit. Since all the elements of individual oscillation circuits are identical, in the case of non-uniformity of the object on the scanned area, the parameters of the resonance will hanged. This change will violate the symmetry in the operation of the individual oscillation circuits. The variation in measured signal can be calibrated in terms of the target parameter or characteristic of the object.

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San Carlos, CA, United States of America

Yuri Vorobyev