Trojan Technologies Inc.

Trojan Technologies Group Ulc

Yuri Lawryshyn

David Olson

Gang Fang

Douglas Penhale

Siva Rajan Sarathy

Domenico Santoro

Harold Wright

Joseph Lem

John Paul Walton

Michael Sasges

Jan M Maarschalkerweerd

Vivian Francesca Dall'Armi

Fariborz Taghipour

Adrian Harrison Murray

Alex Verdun

Paris Neofotistos

John Houghton

Zhang Tan

Tai Fung Tang

There is described an on-line device for controlling a fluid treatment process configured to inactivate a microorganism in a flow of fluid using ultraviolet radiation and a chemical disinfectant. The device includes: a memory for receiving a calculated database of dose response for the ultraviolet radiation and for the chemical disinfectant for a fluid treatment parameter; means to obtain input data about the fluid treatment parameter from the process; means to compare the input data with calculated database; and means to adjust one or more of the amount ultraviolet radiation and the chemical disinfectant added to the flow fluid in response to a difference between the input data and calculated database. There is also described a process for controlling a fluid treatment process configured to inactivate a microorganism in a flow of fluid using ultraviolet radiation and a chemical disinfectant.

Fluid disinfection with ultraviolet radiation and a chemical disinfectant

In one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for the treatment of a fluid comprising a contaminant. In this first aspect the process comprises the steps of: (a) calculating the dose of the treatment agent based on the relationship between concentration of the treatment agent at one or more points and residence time distribution of the treatment system, and (b) contacting the fluid with the treatment agent in the concentration required to meet the dose calculated in step (a). In another one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for reduction of a contaminant in a fluid.

Process and device for the treatment of a fluid containing a contaminant

An online device and method for predicting at least one fluid flow parameter in a process (which comprises a bounded flow domain having disposed therein a pre-determined matrix) includes a computer and/or process steps whereby: (i) a memory receives a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) input data is received from the process, and (iii) the at least one fluid flow parameter is calculated from the database and the input data. Preferably, structure and/or process steps are provided to adjust the database in the event that the input data does not correspond with at least one pre-determined flow state.

On-line device for predicting at least one fluid flow parameter in a process

A cleaning apparatus () for a radiation source assembly () in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber () and a second chamber () independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.

Fluid treatment system and cleaning apparatus therefor

A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve ( ) in sliding engagement with the exterior of the radiation source assembly ( ); a cleaning chamber ( ) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly ( ) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening ( ) to an exterior of the cleaning sleeve; a pressure equalization member ( ) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

An on-line device for predicting at least one fluid flow parameter in a process includes structure and/or function whereby a flow domain has disposed therein a pre-determined portion in which a fluid flows. Preferably, the device includes a computer having: (i) a memory for receiving a database, the database including relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) structure to receive input data from the process, and (iii) structure to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.

There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.

Optical radiation sensor system with cleaning device

A fluid treatment device, particularly useful for ultraviolet radiation treatment of fluids such as water. The device comprises a housing for receiving a flow of fluid. The housing has a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet and at least one radiation source having a longitudinal axis disposed in the fluid treatment zone substantially transverse to a direction of the flow of fluid through the housing. The fluid inlet, the fluid outlet and the fluid treatment zone are arranged substantially collinearly with respect to one another. The fluid inlet has a first opening having: (i) a cross-sectional area less than a cross-sectional area of the fluid treatment zone, and (ii) a largest diameter substantially parallel to the longitudinal axis of the at least one radiation source assembly.

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Komoka, Canada

Yuri Lawryshyn