Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Yunping Di

Lizhong Wang

Ce Ning

Binbin Tong

Liping Lei

Zhen Zhang

Rui Huang

Jianbo Xian

Wei Yang

Fuqiang Li

Chenyang Zhang

Tianmin Zhou

Chengfu Xu

Chunping Long

Zhenyu Zhang

Zheng Fang

Jiahui Han

Xiaochuan Chen

Changfeng Li

Guangcai Yuan

Zhen Liu

Fei Liu

Hui Zhang

Haoliang Zheng

Xianqin Meng

Long Wang

Xue Feng Gao

Pengxia Liang

Yunsik Im

Yichi Zhang

Liwei Liu

Shuilang Dong

Shunhang Zhang

Hongrun Wang

Nianqi Yao

Dapeng Xue

Kai Hou

Xuan He

Weiting Peng

Qinghui Zeng

Yawei Wang

Qiuli Wang

Feihu Zhou

An array substrate, a method for manufacturing an array substrate, a liquid crystal cell and a display apparatus are provided. The array substrate includes: a first base substrate; thin film transistors; a first planarization layer; a common electrode on a side of the first planarization layer away from the thin film transistors; a first dielectric layer on a side of the common electrode away from the first planarization layer; first pixel electrodes on a side of the first dielectric layer away from the common electrode; the first pixel electrodes are electrically connected to the thin film transistors in a one-to-one correspondence through first vias extending through the first dielectric layer and the first planarization layer; a surface of each first pixel electrode away from the first base substrate is provided with a first groove at least corresponding to a corresponding first via.

Array substrate, manufacturing method thereof, liquid crystal cell and display apparatus

An array substrate and a display panel, relating to the technical field of display. The array substrate includes a base substrate, and a thin film transistor group which is provided on one side of the base substrate and includes at least two thin film transistors, the thin film transistors being stacked in a direction perpendicular to the base substrate.

Array substrate and display panel

Disclosed are a thin film transistor and a manufacturing method therefor, a displaying base plate and a displaying apparatus. The thin film transistor includes an active layer, a first insulating layer and a gate layer which are disposed in stack, wherein the active layer includes a source contact area, a drain contact area, and a channel area connecting the source contact area and the drain contact area; the channel area includes a first channel area, a first resistance area and a second channel area sequentially disposed in a first direction; the gate layer includes a first gate and a second gate which are separately disposed; an orthographic projection of the first gate on a plane where the active layer is located covers the first channel area; and an orthographic projection of the second gate on a plane where the active layer is located covers the second channel area.

Displaying base plate and manufacturing method thereof, and displaying device

The present application provides an array substrate, a manufacturing method for the same, and a display panel. The array substrate includes a display area and a non-display area connected to the display area, and the display area includes a plurality of sub-pixels arranged in an array. The non-display area includes at least one polysilicon transistor, each of the sub-pixels includes an oxide transistor and a pixel electrode. A gate of the oxide transistor as well as a first electrode and a second electrode of the polysilicon transistor are arranged in a same layer; an active layer of the oxide transistor and the pixel electrode are arranged in a same layer, and are in contact with each other. The active layer of the oxide transistor includes an oxide semiconductor material, and the pixel electrode includes an oxide conductor material.

Array substrate and manufacturing method for the same, display panel

An array substrate and a display panel. The array substrate includes: a base substrate; a gate line and a data line on the base substrate, the gate line intersect the data line to define a pixel region; a metal oxide thin film transistor is arranged in the pixel region, the metal oxide thin film transistor includes a metal oxide semiconductor layer; the metal oxide semiconductor layer includes a first part and a second part; the first part and the data line are connected through a first via hole; the first part is in a stripe shape; a first included angle is between extension directions of the first part and the data line; an orthographic projection of the second part overlap with an orthographic projection of the gate line on the base substrate and do not overlap with an orthographic projection of the data line on the base substrate.

At least one embodiment of the present disclosure provides a display panel, and the display panel includes: a first substrate and a second substrate oppositely combined with each other, the first substrate includes a base substrate, and a gate line, a first electrode, a first interlayer insulating layer, and second electrode on the base substrate; the first interlayer insulating layer includes a first via hole penetrating through the first interlayer insulating layer, the second electrode is electrically connected to the first electrode the first via hole, first support structure is provided in a region corresponding to the first via hole and on a side of the second electrode away from the base substrate; at least a part of the first support structure is located in the first via hole, an orthographic projection of the first via hole overlaps with an orthographic projection of the gate line on the base substrate.

Display panel having support structures being formed in via holes of the interlayer insulating layer

A displaying base plate and a manufacturing method thereof, and a displaying device. The displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate, wherein the second electrode layer is disposed closer to the substrate, the second electrode layer is connected to the first electrode pattern and the third electrode layer.

Provided is a substrate. The substrate includes a base substrate; and a plurality of sub-pixel structures arranged in an array on the base substrate, wherein the sub-pixel structure comprises: a thin film transistor disposed on the base substrate, the thin film transistor comprising a source and a drain; an insulating layer disposed on a side of the thin film transistor distal from the base substrate, a first via hole being formed in the insulating layer; a pixel electrode disposed on a side of the insulating layer distal from the base substrate, the pixel electrode being electrically connected to either the source or the drain through the first via hole; and a filling block disposed at the first via hole.

Substrate, method for manufacturing same, and display panel

A display substrate, a manufacturing method thereof and a display apparatus are provided. In the present disclosure, a first transistor group with oxide semiconductor as an active layer material is disposed on a side of a second transistor group with polysilicon as an active layer material away from the base, and an area enclosed by orthographic projections of the transistors in the first transistor group on the base is overlapped with an area enclosed by orthographic projections of the transistors in the second transistor group on the base. Stable performance of the transistors included can be ensured in a manufacturing process of the first transistor group and the second transistor group located in different layers, and at the same time, an area occupied by the driving circuit can be reduced so as to decrease a frame width of a display apparatus or improve resolution of the display apparatus.

Display substrate and manufacturing method thereof, and display apparatus

A display panel and a display device are provided. The display panel has a touch side and includes an array substrate and an opposite substrate arranged opposite to each other. The array substrate includes an image sensor array including a plurality of image sensors each including a photosensitive element configured to receive light reflected by a texture touched on the touch side for texture acquisition; the opposite substrate includes a light shielding layer including a plurality of first openings arranged in an array, and the plurality of first openings are in one-to-one correspondence with and partially overlap with the photosensitive elements of the plurality of image sensors in a direction perpendicular to a panel surface of the display panel.

Display panel and display device

Provided is a display panel. The display panel includes an array substrate, a color filter substrate, and a backlight module, wherein the array substrate includes a substrate and a photoelectric sensing device, the substrate is provided with a fingerprint recognition region, and an orthographic projection of the photoelectric sensing device on the substrate is within the fingerprint recognition region. The color filter substrate is disposed opposite to the array substrate, the backlight module is disposed on a side, distal from the array substrate, of the film substrate, and light emitted from the backlight module is capable of passing through the fingerprint recognition region.

Display device, display panel and method for manufacturing same

A method for manufacturing an array substrate, an array substrate, and a fingerprint recognition device. The method includes: forming a plurality of polysilicon patterns on a substrate, the plurality of polysilicon patterns including a first polysilicon pattern for forming the PIN-type diode and a second polysilicon pattern for forming the transistor, each polysilicon pattern including a first sub-region, a second sub-region, and a third sub-region between the first sub-region and the second sub-region; using a first doping process to dope the first sub-region of the first polysilicon pattern and the first sub-region and the second sub-region of the second polysilicon pattern with one of P-type ions and N-type ions respectively; and using a second doping process to dope the second sub-region of the first polysilicon pattern with the other of P-type ions and N-type ions.

Method for manufacturing array substrate, array substrate and fingerprint recognition device

The present disclosure provides a graphene conductive film, a method for forming the same and a flexible touch device. The method for forming a graphene conductive film includes: growing a graphene layer on a metal catalytic substrate; coating a PAA solution onto the graphene layer, and curing the PAA solution so as to form a PI film; and removing the metal catalytic substrate so as to form the graphene conductive film with the PI film.

Graphene conductive film and method for forming the same, and flexible touch device

The invention provides a flexible transparent solar cell and a production process of the same, and belongs to the technical field of solar cell. The flexible transparent solar cell comprises: a flexible transparent substrate, a transparent front-electrode, a cell unit, a transparent back-electrode and a transparent encapsulating layer, which are disposed in this order; the transparent front-electrode comprising a metallic grid thin film layer and a graphene layer; and the transparent back-electrode comprising a nano metal layer and a graphene layer. The invention can be used in production of flexible transparent solar cell, in order to improve conductivity and transparency of solar cells.

Flexible transparent solar cell and production process of the same

The present disclosure provides a method of fabricating a graphene touch sensor, a graphene sensor and a touch-sensitive display device. The method comprises: forming a graphene layer on a substrate; forming a metal layer on the graphene layer; coating a photoresist layer on the metal layer; exposing the photoresist layer by using a gray-scale reticle and developing the exposed photoresist layer to obtain a photoresist completely removed region, a photoresist partially remained region, and a photoresist completely remained region; removing the metal layer located in the photoresist completely removed region; removing the graphene layer located in the photoresist completely removed region; removing the metal layer located in the photoresist partially remained region; coating a protective film on the graphene layer located in the photoresist partially remained region; striping off the remainder photoresist. The embodiment of the present disclosure avoids the alkaline developing solution and the alkaline stripping solution from contacting the graphene film to degrade the conduction of the graphene, thereby increasing yield and reducing cost.

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Beijing, China

Yunping Di