Epistar Corporation

United Microelectronics Corp.

Yung-Hsiang Lin

Chao-Hsing Chen

Chih-Hao Chen

Jia-Kuen Wang

Chi-Shiang Hsu

Aurelien Gauthier-Brun

Chang-Tai Hsaio

Chun-Yuan Chen

Chih-Ming Wang

Ru-Shi Liu

Hao-Yu Chen

Yih-Hua Renn

Wei-Chih Peng

Ya-Nan Mou

Shi-Wen Chen

Yuan-Hui Chen

I-Lun Ma

Cheng-Hsiao Lai

Hsueh-Chen Cheng

Shu-Fen Hu

Ying-Ting Lin

Chien-Hsin Wang

Chai-Wei Fu

Chang-Tai Hisao

A light-emitting device is provided. An active layer is disposed on a substrate and between the first semiconductor layer and the second semiconductor layer. The first aluminum-containing semiconductor layer is disposed between the substrate and the first semiconductor layer, and a first aluminum composition ratio of the first aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The second aluminum-containing semiconductor layer is disposed between the first aluminum-containing semiconductor layer and the first semiconductor layer, and a second aluminum composition ratio of the second aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The stack structure is disposed between the first and second aluminum-containing semiconductor layers, and the stack structure includes first, second, and third indium-containing semiconductor layers stacked in sequence. The first, second, and third indium-containing semiconductor layers are made of InAlGaN (0<a1+b1<1), InAlGaN (0<a2+b2<1, and InAlGaN (0<a3+b3<1), respectively, and 0<a3≤a1<a2.

Light-emitting device

A light-emitting device includes a first semiconductor layer; a semiconductor pillar formed on the first semiconductor layer, including a second semiconductor layer and an active layer, wherein the semiconductor pillar comprises an outmost periphery; a first contact layer formed on the first semiconductor layer and including a first contact portion and a first extending portion, wherein the first extending portion continuously surrounds an entirety of the outmost periphery of the semiconductor pillar and the first contact portion; a second contact layer formed on the second semiconductor layer; a first insulating layer including multiple first openings exposing the first contact layer and multiple second openings exposing the second contact layer; a first electrode contact layer connected to the first contact portion through the multiple first openings and covering all of the first contact layer; a second electrode contact layer connected to the second contact layer through the multiple second openings.

A light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer emitting an UV light, formed between the first semiconductor layer and the second semiconductor layer; a first transparent conductive layer formed on the second semiconductor layer, the first transparent conductive layer including metal oxide; and a second transparent conductive layer formed on the first transparent conductive layer, the second transparent conductive layer including graphene, wherein the first transparent conductive layer is continuously formed over a top surface of the second semiconductor layer, the first transparent conductive layer comprises a thickness smaller than 10 nm.

A light-emitting device includes a first semiconductor layer; a plurality of semiconductor pillars separated from each other and formed on the first semiconductor layer, the plurality of semiconductor pillars respectively includes a second semiconductor layer and an active layer; a first electrode covering one portion of the plurality of semiconductor pillars; and a second electrode covering another portion of the plurality of semiconductor pillars, wherein the plurality of semiconductor pillars under a covering region of the first electrode are separated from each other by a first space, the plurality of semiconductor pillars outside the covering region of the first electrode are separated from each other by a second space, and the first space is larger than the second space.

The present invention discloses a light-emitting device and the manufacturing method thereof. The light-emitting device comprises: a substrate including a protrusion part and a base part; a lattice buffer layer formed on the substrate and including a first region substantially right above the protrusion part and a second region substantially right above the base part, wherein the first region includes a recess therein; a light-emitting stack formed on the lattice buffer layer and the recess; and electrodes formed on and electrically connected to the light-emitting stack.

Light-emitting device and method of manufacturing the same

A voltage regulating circuit provides a feedback voltage and an output voltage based on a power voltage. The voltage regulating circuit includes a reference voltage generator and a compensating circuit. The reference voltage generator receives the power voltage, produces the feedback voltage, and includes an impedance having first and second terminals. The second terminal is coupled to a ground voltage and a first current flows through the impedance at the first terminal to produce the feedback voltage. The compensating circuit includes a negative threshold voltage (NVT) transistor having a source terminal, a drain terminal and a gate terminal. The source terminal receives a power voltage, the drain terminal is connected to the gate terminal and coupled to the first terminal of the impedance through a path to add a second current to the first current when the NVT transistor is turned on under an operational condition at the FF corner.

Voltage regulating circuit

A pulse width estimation method, applied between an integrated circuit and a circuit system for generating a reference pulse with a predetermined pulse width, includes steps for the following: generating an under-test pulse with an under-test pulse width by the integrated circuit; delivering the under-test and reference pulses to the integrated circuit for multiplying the under-test pulse width and the predetermined pulse width thereof by a timing gain and thereby obtaining a gained under-test pulse and a gained reference pulse, respectively; providing, by the integrated circuit, a count pulse for sampling the gained under-test pulse and the gained reference pulse and thereby obtaining a first count number and a second count number, respectively; and estimating the under-test pulse width by using the predetermined pulse width, the first count number and the second count number. A pulse width estimation device is also provided.

Method and device for pulse width estimation

Growing community of inventors

Hsinchu, Taiwan

Yung-Hsiang Lin