Taiwan Semiconductor Manufacturing Comp. Ltd.

Yung-hsiang Chen

Yang-Ann Chu

Yung-yao Lee

Yeh-Chin Wang

Yung-cheng Chen

A method includes providing a workpiece to a semiconductor apparatus, the workpiece including a material layer including a first strip having: a first plurality of exposure fields; and a second plurality of exposure fields alternatingly arranged with the first plurality of exposure fields. The method further includes: scanning the first strip along a first scan route from a first side of the workpiece to a second side of the workpiece to generate first topography measurement data; scanning the first strip along a second scan route from the second side to the first side to generate second topography measurement data; and exposing the first plurality of exposure fields and exposing the second plurality of exposure fields according to the first topography measurement data and the second topography measurement data.

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HSINCHU COUNTY, Taiwan

Yung-hsiang Chen