Mattson Technology, Inc

Beijing E-Town Semiconductor Technology, Co., Ltd

Yun Yang

Michael Xiaoxuan Yang

Rolf Bremensdorfer

Dieter Hezler

Shawming Ma

Joseph Cibere

Dave Camm

Manuel Sohn

Silke Hamm

Alex Wansidler

A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a gas delivery system, and radiative heat sources for heating the workpiece. The gas delivery system includes a gas showerhead assembly that is transparent to electromagnetic radiation emitted from the one or more radiative heat sources. The gas showerhead assembly includes one or more gas diffusion mechanisms to distribute gas within the enclosure.

Workpiece processing apparatus with gas showerhead assembly

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

Arc lamp with forming gas for thermal processing systems

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Berwyn, PA, United States of America

Yun Yang