Korea Research Institute of Standards and Science

Korea Institute of Machinery & Materials

Admbioscience Inc.

Yun Woo Lee

Hyug-gyo Rhee

Ji Hye Lee

Jun-ho Jeong

Dae-Guen Choi

Joo Yun Jung

So Hee Jeon

Junhyuk Choi

Young-sik Ghim

Ho Soon Yang

Young Sik Ghim

A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.

Method for manufacturing nucleic acid film and apparatus for injecting medicine using nucleic acid film

The present disclosure relates to an apparatus for measuring a thickness and a surface profile of a multilayered film structure using an imaging spectral optical system and a measuring method. More specifically, the present disclosure relates to a method and an apparatus which measure a thickness and a surface profile of a multilayered thin film structure by applying a method for obtaining an absolute reflectance value for an object to be measured having a multilayered thin film using a reflected light measuring method and extracting a phase from an interference signal with a reference mirror using a phase shift algorithm.

Apparatus for measuring thickness and surface profile of multilayered film structure using imaging spectral optical system and measuring method

Provided is an operating method of a measuring apparatus measuring a wavefront of a target. The operating method includes measuring a measurement wavefront on the basis of the wavefront of the target, measuring reference slope information and first to third slope information respectively corresponding to a reference direction and first to third directions on the basis of the measurement wavefront, obtaining first to third rotation angles on the basis of the measured reference slope information and first to third slope information, and outputting a wavefront of which an error is corrected, which is generated by rotation errors on the basis of the obtained first to third rotation angles, wherein the first to third rotation angles are differences in angle between the reference direction and the first to third directions.

Correction of rotational inaccuracy in lateral shearing interferometry

The fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.

Apparatus and method for manufacturing fine pattern using interferogram of optical axis direction

Growing community of inventors

Daejeon, South Korea

Yun Woo Lee