Industrial Technology Research Institute

Yun-Sheng Chung

Chun-Hung Lin

Hann-Tsong Wang

Chin-Ching Wu

Chen-Der Tsai

Fu-Ching Tung

Chin-Jyi Wu

Yuh-Feng Chen

Yu-Chuan Tu

Yung-Chen Peng

Hsin-Hung Huang

Wen Jiang Yang

Mu-Huo Cheng

Yung-Ju Huang

A substrate transport device includes a chamber, a rotary wheel, a first magnet, a carrier, and a second magnet. The rotary wheel is disposed outside the chamber. The first magnet is disposed on the rotary wheel. The carrier is disposed in the chamber. The second magnet is disposed on the carrier.

Substrate transport device

An electropolishing device having: an electrode device, which includes a positive electrode guide, a negative electrode guide, a positive electrode plate, a negative electrode plate and a negative working electrode; a clamping apparatus, which includes at least an insulated screw, an upper insulated piece and a lower insulated piece; and an insulated structure, which includes an upper insulated cover and a lower insulated cover.

Electropolishing process means for inner and outer surfaces of a metal

The present invention is an electropolishing process and device for electropolishing an inner surface of a long tube, especially applied to a long tube of greater than two meters and a diameter range between 0.3 and 5 cm. Wherein, the present invention comprises at least one tube, and one complex electrode. An inner surface of the tube is for electropolishing process, and it is an anode as well. The electrode is a cathode and placed on a center of a partition. An end of electrode connects to a cable, the cable is driven by an axial mechanism to be moved the electrode toward the axial mechanism itself. Inside of the tube is full o electrolyte, which is an electrifying medium to connect both anode and cathode. Further, electrolyte cooperates with the electrode to perform the electropolishing process on the inner surface of tube.

Electropolishing process means for an inner surface of a long tube

An MFC controlling device automation method and related system. The method mainly comprises the steps of automatically controlled algorithmic obtaining of MFC open loop system parameters by an identification technique; automatically controlled algorithmic determining of PI control parameters by a dominant pole-placement method; and automatically controlled calculating of a fuzzy logic rule table. The steps form an automatically controlled single closed loop. By performing said steps, multiple PI control parameter sets are obtainable fast and in an automatic way, and a calculation is done to form a refined fuzzy rule data table, so that a greatly enhanced MFC reaction function is attained.

Mass flow controller automation method and related system

Growing community of inventors

Hsinchu, Taiwan

Yun-Sheng Chung