Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

Yun-Jong Yeo

Hong-Kee Chin

Yu-Gwang Jeong

Sang-Gab Kim

Joo-Hyung Lee

Ki-Hun Jeong

Shin-Il Choi

Sung-Ryul Kim

Dong-Ju Yang

Dae-Cheol Kim

Jung-Ha Son

Jung-Suk Bang

Ki-Yeup Lee

Ji-Young Park

Hee-Joon Kim

Jae-Hong Kim

Seung-Ha Choi

Joo-han Kim

Woong-Kwon Kim

Chang-Hoon Kim

Yeo-Geon Yoon

Kun-Wook Han

Byeong-Hoon Cho

Ki-Yong Song

Su-Bin Bae

Sung-Hen Cho

Jeong-Min Park

Dae-Young Lee

Dong-Yoon Kim

Eun-Guk Lee

Hyun-Min Cho

Sang-Ki Kwak

Byung-Duk Yang

Lei Xie

Yu Gwang Jeong

Ji-Hun Kim

Sung-Jin Mun

Sung-Won Cho

Hyun Bin Cho

An imprint lithography method includes disposing a mask layer on a base substrate in first and in second areas, reducing a thickness of the mask layer in the first area, disposing a first planarization layer on the mask layer in the first and second areas, forming a first imprint pattern on the first planarization layer, forming a first planarization layer pattern by etching the first planarization layer using the first imprint pattern, forming a first mask pattern in the first area by etching the mask layer using the first planarization layer pattern, diposing a second planarization layer on the first mask pattern and the mask layer in the first and second areas, forming a second imprint pattern on the second planarization layer, forming a second planarization layer pattern by etching the planarization layer using the second imprint pattern, and forming a second mask pattern in the second area.

Imprint lithography method, method for manufacturing master template using the method and master template manufactured by the method

A touch screen panel including a touch electrode disposed on a base substrate, the touch electrode including a plurality of mesh patterns formed by crossing of metal wirings. The mesh patterns include a main electrode pattern and a buffer pattern overlapping the main electrode pattern, the buffer pattern having a thickness greater than 20% of a thickness of the main electrode pattern and less than 30% of a thickness of the main electrode pattern.

Touch screen panel and method of manufacturing the same

A method of manufacturing a polarizer includes forming a first layer on a base substrate, forming a first partition wall layer on the first layer, forming a second partition wall layer on the first partition wall, forming a plurality of first partition wall patterns and a plurality of second partition walls disposed on the first partition wall patterns by etching the first partition wall and the second partition wall at the same time, forming a block copolymer layer on the first layer on which the plurality of first partition wall patterns are formed, forming a plurality of fine patterns from the block copolymer layer, and patterning the first layer using the fine patterns and the second partition wall patterns as a mask.

Polarizer, method of manufacturing the polarizer and display panel having the polarizer

In a touch screen substrate and a method of manufacturing the same, the touch screen substrate includes a base substrate, a light blocking pattern, a first sensing element and a first switching element. The light blocking pattern includes an inorganic layer formed on the base substrate and a light blocking layer formed on the inorganic layer, the light blocking layer transmitting an infrared light and absorbing a visible light. The first sensing element is formed on the light blocking pattern and senses the infrared light. The first switching element is electrically connected to the first sensing element. Thus, an undercut may be prevented from being formed at a lower portion of the light blocking pattern, and an adhesive strength between the light blocking pattern and the base substrate may be enhanced.

Touch screen substrate and method of manufacturing the same

A display panel includes a first substrate comprising a plurality of pixel areas, a second substrate facing the first substrate, a liquid crystal layer interposed between the first substrate and the second substrate, a thin film transistor comprising a gate electrode disposed on the first substrate, a semiconductor pattern overlapping with the gate electrode, a source electrode and a drain electrode overlapping with the semiconductor pattern and spaced apart from each other, a plasmonic color filter to which a common voltage is configured to be applied, and comprising a same material as the gate electrode, disposed on a same layer as the gate electrode, and comprising a plurality of holes through which light is configured to be transmitted and a pixel electrode to which a gray scale voltage is configured to be applied, and overlapping with the plasmonic color filter, and electrically connected to the drain electrode.

Display panel and method of manufacturing the same

A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.

Contact portion of wire and manufacturing method thereof

A method of forming a fine pattern includes providing a first metal layer on a base substrate, providing a first passivation layer on the first metal layer, providing a mask pattern on the first passivation layer, providing a partitioning wall pattern having a reverse taper shape by etching the first passivation layer, coating a composition having a block copolymer between the partitioning wall patterns adjacent each other, providing a self-aligned pattern by heating the composition, and providing a metal pattern by etching the first metal layer using the self-aligned pattern as a mask.

Method of forming a fine pattern

A display substrate includes a base substrate, a switching element, a protecting layer, an organic layer, a first pixel electrode and a second pixel electrode. The switching element is on the base substrate, and includes a gate electrode, a source electrode and a drain electrode. The protecting layer is on the switching element, and includes a first hole exposing the drain electrode. The organic layer is on the protecting layer, and includes a second hole which exposes a side surface of the protecting layer which defines the first hole and exposes a top surface of the protecting layer which is adjacent to the side surface of the protecting layer. The first pixel electrode is on the organic layer. The second pixel electrode overlaps the first pixel electrode, and is electrically connected to the drain electrode via the first and second holes.

Display substrate including organic layer and method of manufacturing the same

A display device includes an infrared sensing transistor and a visible sensing transistor. The visible sensing transistor includes a semiconductor on a substrate; an ohmic contact on the semiconductor; an etch stopping layer on the ohmic contact; a source electrode and a drain electrode on the etch stopping layer; a passivation layer on the source electrode and the drain electrode; and a gate electrode on the passivation layer. The etch stopping layer may be composed of the same material as the source electrode and the drain electrode. The infrared sensing transistor is similar to the visible sensing transistor except the etch stopping layer is absent.

Visible sensing transistor, display panel and manufacturing method thereof

A touch sensing substrate includes a substrate, a first light sensing element, a second light sensing element and a first bias line. The first light sensing element includes a first gate electrode, a first active pattern overlapping with the first gate electrode, a first source electrode partially overlapping with the first active pattern and a first drain electrode partially overlapping with the first active pattern. The second light sensing element includes a second gate electrode, a second active pattern overlapping with the second gate electrode, a second source electrode partially overlapping with the second active pattern and a second drain electrode partially overlapping with the second active pattern. The first bias line is connected to the first and second gate electrodes.

Touch sensing substrate and method of manufacturing the same

An optical sensor includes a visible light sensor includes a visible light sensing transistor and an infrared light sensor includes an infrared light sensing transistor, wherein the visible light sensing transistor receives a first driving voltage through a first driving voltage line, the infrared light sensing transistor receives a second driving voltage through a second driving voltage line, and the visible light sensing transistor and the infrared light sensing transistor receive a reference voltage through a reference voltage line.

Optical sensor

A method of fabricating a thin film transistor array substrate is presented. The method entails forming a gate interconnection line on an insulating substrate, forming a gate insulating layer on the gate interconnection line, forming a semiconductor layer and a data interconnection line on the semiconductor layer, sequentially forming multiple passivation layers, etching the passivation layers down to a drain electrode that is an extension of the data interconnection line. The portion of the drain electrode that is exposed at this stage is a part of the drain electrode-pixel electrode contact portion. A pixel electrode is formed connected to the drain electrode. Two of the passivation layers have the same composition but are processed at different temperatures. A thin film transistor prepared in the above manner is also presented.

Method of fabricating a thin film transistor array substrate

A liquid crystal display according to an exemplary embodiment of the present invention includes: a first substrate; a first signal line disposed on the first substrate, a thin film transistor connected with the first signal line, a first color filter and a second color filter disposed on the first substrate; a colored member disposed on the first color filter and the second color filter; and a pixel electrode disposed on the first color filter and the second color filter and the colored member, wherein the first color filter and the second color filter are partially overlapped with each other and the height of the colored member disposed at the overlap between the first color filter and the second color filter is greater than the height of the colored member disposed not at the overlap.

Liquid crystal display

Growing community of inventors

Seoul, South Korea

Yun-Jong Yeo