Taiwan Semiconductor Manufacturing Comp. Ltd.

Himax Technologies, Inc.

Ncku Research and Development Foundation

Yun Chen Chang

Ching-Hwanq Su

Chih-Mu Huang

Hung-Jen Lin

Chih-Fu Chang

Tzung-Ren Wang

Yen-Hsiu Chen

Ming-Der Shieh

Der-Wei Yang

Ming-Chu King

An auto-contrast enhancement system includes a human visual system (HVS)-based local difference (LD) histogram unit configured to build a LD histogram with respect to intensity values; a histogram classifier configured to categorize histograms of input images based on distribution properties; and a histogram equalization (HE) unit configured to process the input image according to a result of the HVS-based LD histogram unit and the enhancement level determined in the histogram classifier.

Auto-contrast enhancement system

A novel, low-temperature metal deposition method which is suitable for depositing a metal film on a substrate, such as in the fabrication of metal-insulator-metal (MIM) capacitors, is disclosed. The method includes depositing a metal film on a substrate using a deposition temperature of less than typically about 270 degrees C. The resulting metal film is characterized by enhanced thickness uniformity and reduced grain agglomeration which otherwise tends to reduce the operational integrity of a capacitor or other device of which the metal film is a part. Furthermore, the metal film is characterized by intrinsic breakdown voltage (V) improvement.

Low temperature method for metal deposition

Growing community of inventors

Tainan, Taiwan

Yun Chen Chang