Tdk Corporation

Yumiko Ozaki

Osamu Shinoura

Eiju Komuro

Akira Shibue

A capacitor comprises: a lower electrode formed of a foil made of a polycrystalline metal; an upper conductor layer; and a dielectric layer disposed between the lower electrode and the upper electrode layer. Grain boundaries of the polycrystalline metal appear at the top surface of the lower electrode. The capacitor further comprises an insulator that is disposed between the top surface of the dielectric layer and the bottom surface of the upper electrode layer and that is present only in part of a region in which the top surface of the dielectric layer and the bottom surface of the upper electrode layer face each other. The insulator is disposed to cover at least part of the grain boundaries appearing at the top surface of the lower electrode when seen from above the top surface of the dielectric layer. The insulator is formed by electrophoresis.

Capacitor and method of manufacturing same

A method of manufacturing a thin-film electronic device comprising providing a dielectric layer on a base, providing a first electrically conductive layer having a first opening and covering at least part of the dielectric layer; and forming a first through-hole extending through the base and communicating with the first opening. A second electrically conductive layer may be provided on the base, and a dielectric layer may be provided so as to cover at least part of this second conductive layer.

Method of manufacturing thin-film electronic device having a through-hole extending through the base and in communicative connection with an opening in the electrically conductive layer

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Tokyo, Japan

Yumiko Ozaki