Sumitomo Chemical Company, Limited

Yuko Yamashita

Koji Ichikawa

Masako Sugihara

Isao Yoshida

Akira Kamabuchi

Nobuo Ando

A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I'): wherein R, R, Rand Rindependently each represent a C1-C8 alkyl group, and Arepresents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

Photoresist composition

Salt, photoresist composition, and method for producing photoresist pattern

A salt represented by the formula (I-Pa): wherein Xrepresents a single bond or a C1-C4 alkylene group,

Salt and photoresist composition containing the same

A salt represented by the formula (I&#x2014;Pb): 

The present invention provides a photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): wherein Qand Qindependently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., Xrepresents &#x2014;O&#x2014;CO&#x2014; etc., and Arepresents an organic counter ion, and a compound represented by the formula (D'): wherein R, R, Rand Rindependently represent a C1-C20 alkyl group etc., and Arepresents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

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Toyonaka, Japan

Yuko Yamashita