Nec Corporation

Yuko Seki

Shigeru Yoneda

Akio Furukawa

Yutaka Urino

Tadahiko Hanada

Naoki Ofusa

A waveguide optical switch has a waveguide whose refractive index changes can be controlled by an electro-optic effect and an UV guide waveguide for coupling an ultraviolet radiation to the waveguide. A portion of the waveguide and a portion of the UV guide waveguide make up a directional coupler.

Optical waveguide device to be optically poled, method of manufacturing optical waveguide device to be optically poled, and method of optically poling optical waveguide device

A phase difference measuring device includes a first light source, an optical branching device, an optical path length adjusting device, a combining device, a measuring unit, and a second light source. Ultraviolet light emitted by the first light source is branched into a first portion of luminous flux that passes along a sample optical path in which the object to be measured is provided and a second portion of luminous flux that passes along a reference optical path. The optical path length adjusting device is provided in the reference optical path and adjusts the difference in optical path length between the sample optical path and reference optical path. The first portion of luminous flux that has passed along the sample optical path and the second portion of luminous flux that has passed along the reference optical path are recombined by the combining device. The measuring unit then calculates the phase difference of the two portions of luminous fluxes caused by the object to be measured based on the spacing and light intensity of the interference fringes produced by the luminous flux combined by the combining device. The second light source irradiates visible light for illumination, and this visible light is directed to the measuring unit such that its optical axis coincides with the optical axis of the combined ultraviolet light.

Phase difference measuring device with visible light source for

A laser processing method for ablating a transparent material is disclosed. A laser beam absorption layer is formed in a desired ablation portion beforehand by the implantation of an impurity or the increase of a defect density. The absorption layer obviates damage ascribable to thermal strain and, when use is made of a VUV (Vacuum Ultra Violet) beam, damage to portions other than an irradiated portion. This allows a simple apparatus to implement the ablation of a transparent film.

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Tokyo, Japan

Yuko Seki