Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

M Bio Technology Inc.

National Institute of Infectious Diseases

Shiseido Company, Limited

Yuko Sasaki

Hiroyuki Ito

Minoru Yamazaki

Kenji Tanimoto

Makoto Suzuki

Wataru Mori

Hajime Kawano

Hiroshi Makino

Yutaka Kaneko

Hiroyuki Shinada

Mari Nozoe

Takanori Ninomiya

Atsuko Takafuji

Hisaya Murakoshi

Taku Ninomiya

Yuji Kasai

Mitsugu Sato

Takashi Doi

Makoto Ezumi

Toshiyuki Yokosuka

Makoto Sakakibara

Noritsugu Takahashi

Ryota Watanabe

Kazuhiro Matsuda

Makoto Nishihara

Yuzuru Mochizuki

Toshiaki Yanokura

Tomohito Nakano

Yoshichika Arakawa

Tsutomu Kawai

Nobuo Nomura

Yasuo Endo

Norio Katayama

Yoshihiro Nishida

Ryo Harasawa

Sachie Matsuda

Koji Ichiyama

Hiroyuki Takahashi

Takashi Hiroi

Yasunari Sohda

Hideyuki Kazumi

Tohru Ishitani

Yoshinori Nakayama

Tadashi Otaka

Akira Ikegami

Takeshi Kawasaki

Wen Zheng Li

Momoyo Enyama

Yasuhiro Gunji

Zhaohui Cheng

Hiromi Inada

Shinichi Murakami

Akira Minato

Kazunari Asao

Takashi Honda

Shiro Kobayashi

Yasumasa Furutani

Yasuo Goto

Ryoichi Ishii

Yoshiya Higuchi

Taichi Maeda

Katsumi Suzuki

Tomio Yoshida

Etsu Nishijima

Miyako Okamoto

Miki Ishida

Hiroko Yano

Saburo Shoji

U Oh

Wataru Yamane

Yoshiko Masushio

Kumiko Kuroki

Wakae Matsuyama

Hirofumi Kera

To provide a charged particle beam device including a booster electrode and an object lens that generates a magnetic field in a vicinity of a sample, and capable of preventing ion discharge, an insulator is disposed between a magnetic field lens and the booster electrode. A tip of the insulator protrudes to a tip side of an upper magnetic path from a tip of a lower magnetic path of the magnetic field lens. The tip on a lower side of the insulator is above the lower magnetic path, and a non-magnetic metal electrode is embedded between the upper magnetic path and the lower magnetic path.

Charged particle beam device

The present invention provides a charged particle beam device with which optimal parameters for the device can be effectively derived in a short time period. This charged particle beam device comprises: an electron gun () that irradiates a sample () with an electron beam (); an image processing unit () that acquires an image of the sample () from a signal () generated by the sample () due to the electron beam (); a database () that holds correspondence between a first parameter that is an optical condition, a second parameter that is a value pertaining to device performance, and a third parameter that is information pertaining to the device configuration, and stores a plurality of analysis values and measurement values; and a learning machine () that searches the database () and derives a first parameter that satisfies a target value of the second parameter.

Disclosed is a solution for quickly specifying an optical condition of a wafer to be inspected, and in particular, accelerating optical condition setting after obtaining a customer wafer. An inspection apparatus automatic adjustment system according to the present invention includes an analysis-condition-setting interface that inputs analysis conditions; an analysis-execution unit that performs analysis; an inspection-device model and model DB used for analysis; an analysis-result DB that stores analysis results; an observation-condition setting interface that inputs a wafer pattern, a focus point, an optimization index, and a priority; a wafer-pattern search unit that searches for a wafer pattern similar to the input wafer pattern; an optical-condition-extraction unit that extracts, from the analysis result DB, the optimum optical condition for the similar wafer pattern and the focus point; and an optical-condition-setting unit that generates a control signal corresponding to the optical condition and transmits the control signal to the inspection apparatus.

Inspection apparatus adjustment system and inspection apparatus adjustment method

An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.

A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.

Charged particle beam device and capturing condition adjusting method in charged particle beam device

A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

Measuring device and measuring method

A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.

Measurement and inspection device

A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

Charged particle beam apparatus and method for adjusting imaging conditions for the same

Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.

Disclosed is a vaccine which has a high therapeutic effect oninfection and is highly safe. For the purpose of developing effective therapeutic methods forinfection,-mimic particles which are effective as a vaccine forinfection are provided, and also provided are bacterium-mimic particles including common bacteria. Bacterium-mimic particles such as-mimic particles can be provided by producing liposome particles in which a lipid antigen specific to a pathogenic bacterium such asis contained as a liposome-constituting lipid component. The administration of the-mimic particles enables the induction of a potent immunological activity in living bodies. The-mimic particles can be used as an excellent vaccine for the prevention or treatment ofinfection.

Vaccine for mycoplasma infection

A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter () is arranged between a detector and a lens () arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device () is provided for the interlocked control of the Wien filter () and a lens () arranged on the charged-particle-source side among the two stages of lenses.

Charged-particle-beam device

An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

Charged particle beam apparatus

Provided is a charged particle beam device having an energy filter. In one embodiment, a charged particle beam device includes a deflector to deflect charged particles emitted from a sample to an energy filter, and a change in brightness value with the change of voltage applied to the energy filter is found for each of a plurality of deflection conditions for the deflector, and a deflection condition such that a change in the brightness value satisfies a predetermined condition is set as the deflection condition for the deflector.

Charged particle beam device having an energy filter

Growing community of inventors

Tokyo, Japan

Yuko Sasaki