Panasonic Corporation

Yuko Okumoto

Akihito Miyamoto

Takaaki Ukeda

Kouhei Koresawa

Kenichi Sasai

An electronic device including: a substrate; a bank formed above the substrate; a semiconductor layer formed within an aperture surrounded by the bank; and electrodes electrically connected to the semiconductor layer. An outline of the aperture in plan view includes a first straight edge, a second straight edge continuous with one end of the first edge via a first connector, and a straight third edge continuous with the other end of the first edge via a second connector. The area of a first connector region differs from the area of a second connector region, the first connector region being defined by a first imaginary straight line along the first edge, a second imaginary straight line along the second edge, and the first connector, and the second connector region being defined by a third imaginary straight line along the third edge, the first imaginary straight line, and the second connector.

Electronic device and electronic device manufacturing method

An electronic device including: a substrate; a bank formed on an upper surface of the substrate, surrounding an area of the upper surface of the substrate, and defining an aperture from which the area is exposed; a liquid-philic layer formed on a peripheral portion of the area, and not overlapping a central portion of the area; a semiconductor layer formed within the aperture, and attaching to at least a portion of the central portion and to an upper surface of the liquid-philic layer; and a pair of electrodes that are in contact with an area of the semiconductor layer, the area of the semiconductor layer not overlapping the liquid-philic layer in plan view. The bank has a liquid-phobic lateral surface surrounding the aperture, and the upper surface of the liquid-philic layer has a higher degree of liquid-philicity than the upper surface of the substrate.

A display panel device includes: a gate electrode above a substrate; a gate insulator above the gate electrode; a first source electrode and a first drain electrode above the gate insulator; a second source electrode and a second drain electrode above the first source electrode and the first drain electrode respectively; a first partition wall part having an opening in which the second source electrode and the second drain electrode are exposed; a semiconductor layer in the opening; an insulation layer above the semiconductor layer; a lower electrode above the insulation layer; and a contact hole in the insulation layer, for connecting the lower electrode and the second drain electrode or the second source electrode, wherein a film structure of each of the second source electrode and the second drain electrode is sparser than a film structure of each of the first source electrode and the first drain electrode.

Display panel device and method of manufacturing display panel device

A thin film transistor element is formed in each of adjacent first and second apertures defined by partition walls. In plan view of a bottom portion of the first aperture, a center of a total of areas of a source electrode portion and a drain electrode portion is offset from a center of area of the bottom portion in a direction opposite a direction of the second aperture, and in plan view of a bottom portion of the second aperture, a center of a total of areas of a source electrode portion and a drain electrode portion is offset from a center of area of the bottom portion in a direction opposite a direction of the first aperture.

Thin-film transistor device and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device

A thin film transistor element includes: a gate electrode; a source electrode and a drain electrode; an insulating layer; partition walls; and an organic semiconductor layer. The partition walls define a first aperture. Within the first aperture, at least a part of the source electrode and at least a part of the drain electrode are in contact with the semiconductor layer. The partition walls have side face portions facing the first aperture, and some of the side face portions have gentler slopes than the rest of the side face portions.

Thin-film transistor element and method for producing same, organic EL display element and method for producing same, and organic EL display device

A thin film transistor element includes: a gate electrode; a source electrode and a drain electrode; an insulating layer; partition walls; and an organic semiconductor layer. The partition walls define a first aperture. Within the first aperture, at least a part of the source electrode and at least a part of the drain electrode are in contact with the semiconductor layer. In plan view of the bottom of the first aperture, the center of the total of the areas of the source electrode and the drain electrode is offset from the center of the area of the bottom in a given direction.

Thin-film transistor element and method for producing same, organic el display element, and organic el display device

A thin film transistor element is formed in each of a first aperture and a second aperture defined by partition walls, which further define a third aperture that is adjacent to the first aperture with a gap therebetween and is located in a direction, from the first aperture, differing from a direction of the second aperture. In plan view, at a bottom portion of the first aperture, a center of area of a liquid-philic layer portion is offset from a center of area of the bottom portion in a direction differing from a direction of the third aperture, and at a bottom portion of one of the first and second apertures, a center of area of a liquid-philic layer portion is offset from a center of area of the bottom portion in a direction differing from a direction of the other one of the first and second apertures.

Thin-film transistor device and method for manufacturing same, organic electroluminescent display elements and organic electroluminescent display device

In a thin film transistor device, partition walls define first, second, and third apertures. In plan view, at a bottom portion of the first aperture, a center of a total of areas of a source electrode portion and a drain electrode portion is offset from a center of area of the bottom portion in a direction differing from a direction of the third aperture, and at a bottom portion of one of the first and second apertures, a center a total of areas of a source electrode portion and a drain electrode portion is offset from a center of area of the bottom portion in a direction differing from a direction of the other one of the first and second apertures.

A thin film transistor element includes a gate electrode, an insulating layer formed on the gate electrode, and partition walls formed on the insulating layer and defining a first aperture above the gate electrode. The thin film transistor element further includes, at a bottom portion of the first aperture, a source electrode and a drain electrode that are in alignment with each other with a gap therebetween, a liquid-philic layer, and a semiconductor layer that covers the source electrode, the drain electrode, and the liquid-philic layer as well as gaps therebetween. The liquid-philic layer has higher liquid philicity than the insulating layer, and in plan view of the bottom portion of the first aperture, a center of area of the liquid-philic layer is offset from a center of area of the bottom portion of the first aperture.

Thin-film transistor element and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device

A thin-film transistor including: a gate electrode that is located above a substrate; a gate insulating layer that faces the gate electrode; a partition that defines an opening and has higher liquid repellency than liquid repellency of the gate insulating layer, the opening having a surface of the gate insulating layer therewithin; a semiconductor layer that faces the gate electrode with the gate insulating layer interposed therebetween and is formed within the opening by an application method; a source electrode and a drain electrode that are electrically connected to the semiconductor layer; and an intermediate layer that is made of the same material as a material of the partition and is located between the gate insulating layer and the semiconductor layer, wherein the intermediate layer is discretely present above the gate insulating layer.

Thin-film transistor, display panel, and method for producing a thin-film transistor

A thin film transistor element is formed in each of adjacent first and second apertures defined by partition walls. In plan view of a bottom portion of the first aperture, a center of area of a liquid-philic layer portion is offset from a center of area of the bottom portion in a direction opposite a direction of the second aperture, and in plan view of a bottom portion of the second aperture, a center of area of a liquid-philic layer portion is offset from a center of area of the bottom portion in a direction opposite a direction of the first aperture.

Provided is a manufacturing method for a semiconductor transistor comprising: forming a resist layer containing resist material on a base layer including a substrate; patterning the resist layer to form apertures therein; forming a metal layer by disposing metallic material to cover the resist layer and to fill the apertures formed in the resist layer; removing a metal oxide layer formed by oxidation of a top surface of the metal layer by performing cleaning by using a cleaning liquid; forming the source electrode and the drain electrode by removing the resist layer by using a dissolution liquid different from the cleaning liquid, the source electrode and the drain electrode constituted of the metallic material having been disposed in the apertures; and forming a semiconductor layer so as to cover the source electrode and the drain electrode.

Semiconductor transistor manufacturing method, driving circuit utilizing a semiconductor transistor manufactured according to the semiconductor transistor manufacturing method, pixel circuit including the driving circuit and a display element, display panel having the pixel circuits disposed in a matrix, display apparatus provided with the display panel

Growing community of inventors

Osaka, Japan

Yuko Okumoto