Tokyo Electron Limited

Yukiyoshi Aramaki

Naoki Matsumoto

Jun Yoshikawa

Masayuki Kohno

Koji Koyama

Yusuke Yoshida

Michitaka Aita

Ryou Son

Ippei Shimizu

Masami Sudayama

A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.

Plasma processing apparatus

Growing community of inventors

Miyagi, Japan

Yukiyoshi Aramaki