Mitsubishi Rayon Company, Limited

Yukiya Wakisaka

Tadayuki Fujiwara

Akira Yanagase

Masayuki Tooyama

Yoshihiro Kamon

Hikaru Momose

Naoshi Murata

Toru Tokimitsu

Yoko Kakuno

Koji Nishida

A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II):

Resins for resists and chemically amplifiable resist compositions

The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25&#xb0; C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.

Chemical amplification resist composition

The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of &minus;10 to &plus;10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure. The copolymer according to the present invention exhibits superior adhesion properties to surfaces possessing a high polarity, such as metal surfaces and the like, in addition to excellent hydrophobic and thermal resistance properties, and also displays a favorable solubility in solvents used for paints, resists, and the like.

Copolymer, process for producing the same, and resist composition

A photocuring sheet wherein a photocuring resin composition (A) comprising an acrylic resin with a photopolymerizable functional group on the side chains (a-1) and a photopolymerization initiator (a-2), is laminated on a transparent base sheet (B), photocuring decorative sheets and photocuring insert molding sheets employing it, and molded articles and a process for their manufacture, in which the sheets are used.

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Hiroshima, Japan

Yukiya Wakisaka