Nitto-Denko Corporation

Yukitoshi Hase

Masayuki Yamamoto

Saburo Miyamoto

Yasuji Kaneshima

Masaru Irie

A semiconductor wafer joined to a carrier via a double-faced adhesive tape having an adhesive layer of a heating separation property is heated for removal from the carrier. The double-faced adhesive tape is separated from the semiconductor wafer on a holding table. Thereafter, an air nozzle preliminarily cools the semiconductor wafer for a given time during transportation with a wafer transport section. Upon completion of the preliminary cooling, the semiconductor wafer is placed on a cooling stage to cool it to a target temperature.

Semiconductor wafer transport method and semiconductor wafer transport apparatus

A joint detector detects a joint in an adhesive tape supplied from a tape supply section, and a computing unit determines a suitable cutting position of the adhesive tape for removing the joint in accordance with the detected results. A controller controls each mechanism to operate so as to satisfy the determined results by the computing unit. Thereafter, the adhesive tape including the joint is cut and removed.

Adhesive tape joining method and adhesive tape joining apparatus

A cutter blade is cut-in by being moved towards a deep part of a notch from one open end of the notch while being moved in a forward direction with respect to an outer periphery of a wafer. Immediately before a blade edge reaches the deep part of the notch, cutting movement of the cutter blade is once stopped, reversely moved to a initial piercing position, and thereafter, the cutter blade is moved towards the deep part of the notch from the other open end of the notch while being moved in a reverse direction with respect to the outer periphery of the wafer.

Method for cutting protective tape of semiconductor wafer and protective tape cutting device

A method of this invention involves capturing an image of an outer periphery of a semiconductor wafer, by use of a CCD camera, performing image analysis on data about the captured image, detecting defects such as chips and cracks on the outer periphery of the semiconductor wafer, storing positions of the respective defects, calculating a clearance between the adjacent defects from information about the stored positions, comparing the calculated clearances with a preset width of a separation tape, and obtaining the clearance larger than the width of the separation tape, by arithmetic processing. If some of the clearances are larger than the width of the separation tape, this method also involves setting an appropriate one of the clearance as a position where the separation tape is joined, performing alignment on the semiconductor wafer, joining the separation tape to a protective tape joined to a surface of the semiconductor wafer, and separating the protective tape together with the separation tape from the surface of the semiconductor wafer.

Method and apparatus for separating protective tape from semiconductor wafer

A supporting substrate is laminated on a wafer in such a manner that the supporting substrate locked in peripheral edges with a plurality of locking claws is disposed in proximity to and facing to an adhering surface of a double-sided adhesive sheet on the workpiece, the supporting substrate is pressed by a pressing member made of an approximately hemispherical elastic body from an approximate center of a non-adhering surface of this supporting substrate, the supporting substrate is laminated by elastically deforming this pressing member on the wafer while making the supporting substrate surface contact in a flat condition.

Method for laminating substrate and apparatus using the method

This invention is directed to a method for joining an adhesive tape having the steps (1) separating, from a first adhesion face of a double-sided adhesive tape having first and second separators attached to front and back adhesion faces thereof, the first separator, and joining the double-sided adhesive tape to a surface of a substrate; (2) joining the double-sided adhesive tape to the substrate while a joining roller provided in a tape joining unit presses the second separator with rolling, and taking up the second separator wound and turned around by the joining roller and separated from a second adhesion face of the double-sided adhesive tape in a second separator collecting unit provided in the tape joining unit while rolling the joining roller synchronously; and (3) cutting the double-sided adhesive tape joined to the substrate with the adhesion faces thereof being exposed along with a contour of the substrate.

Method for joining adhesive tape

A work is suction-held by an upper suction chuck stage from the surface side of a supporting member, is moved upward to a predetermined height, and is heated in a state where the thickness direction of a both-faced adhesive sheet is not restricted, and a dicing tape is cooled. After lapse of predetermined heating time, the work is separated from the both-faced adhesive sheet whose adhesive strength is weaken, and drops to a lower suction chuck stage.

Method for separating semiconductor wafer from supporting member, and apparatus using the same

With respect to a work obtained by joining a semiconductor wafer and a supporting member to each other via a both-faced adhesive sheet having heating separability, the surface of the supporting member is suction-held at a suction stage and is heated, thereby making the adhesive strength of an adhesive layer almost disappear. A Bernoulli chuck is moved close from the back side of the semiconductor wafer to separate the semiconductor wafer in a non-contact manner and to suspension-hold the semiconductor wafer in a state where the semiconductor wafer floats in the air.

Method of separating semiconductor wafer, and separating apparatus using the same

A joining roller rolls on the surface of a reinforcing substrate held by a center and side latch claws so as to be close and opposite to an wafer placed and held on a holding table in the condition that an adhesive sheet is adhered on the surface, whereby joining proceeds. As the joining roller rolls, both of the latch claws oscillate downward and the latch claws themselves move down while keeping the bend of the reinforcing substrate nearly constant, and retract when the joining roller approaches the latch claws.

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Kameyama, Japan

Yukitoshi Hase