Fujitsu Corporation

Fujitsu Semiconductor Limited

Yukisada Horie

Takashi Kurihara

Kenji Suzuki

Ryo Shibata

Katsuhito Kojima

Takeo Moriyama

A method for generating reticle data for forming a reticle. The method includes recognizing a non-layout region free from main chips in a process pattern, dividing the non-layout region into a plurality of rectangular non-layout regions, generating scribe data using the plurality of divided rectangular non-layout region as a plurality of dummy chips, and generating a dummy pattern for each of the dummy chips.

Method and apparatus for generating reticle data

A method of preparing layout data of patterns formed in a scribe area. First, library data on which a plurality of patterns and arrangement limiting conditions of each pattern and arrangement importance of each pattern are registered is prepared. A pattern to be arranged in the scribe area is selected from the library data. Then, the selected pattern in the scribe area is arranged in accordance with the arrangement limiting conditions and arrangement importance of the selected pattern. In this method, it is not necessary to prepare many arrangement models, so that preparing time of layout data is shortened.

Method and apparatus for prepareing patterns used for manufacture of semiconductor device

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Kasugai, Japan

Yukisada Horie