Canon Kabushiki Kaisha

Yukio Tokuda

Yukio Takabayashi

Masao Kosugi

Nobushige Korenaga

Yoshikazu Miyajima

Shigeyuki Uzawa

Mitsuru Inoue

Kazuo Iizuka

Hiromichi Hara

Nobuyoshi Deguchi

An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comprises a measuring device configured to perform measurement for the alignment, a first support configured to support the measuring device; and a second support configured to support the projection optical system. The first support and the second support are isolated from each other.

Exposure apparatus and device manufacturing method

A driving apparatus for moving an object has a stage which moves the object mounted thereon, a base member supporting the stage, a reaction force reception structure for receiving a reaction force generated upon driving the stage, a damp member for damping transmission of vibration with a predetermined frequency range from the reaction force reception structure to a floor and an actuator for generating a force between the base member and the reaction force reception structure.

Driving apparatus and exposure apparatus

A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m,, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.

Stage system and exposure apparatus, and device manufacturing method using the same

A stage system includes a movable stage having a static bearing and a magnet preloading mechanism, and a base having a guiding surface for guiding the movable stage. The base has an accumulated structure including a first layer of a magnetic material provided at the guiding surface, and a second layer of a non-magnetic material.

Stage system for exposure apparatus

An exposure method includes holding a reticle fixed, holding a wafer fixed, irradiating the reticle with an exposure beam, projecting an image of the irradicated reticle onto the wafer through a projection optical system, and re-mounting the reticle as the temperature of the reticle reaches or exceeds a predetermined temperature.

Exposure method using reticle remount for temperature influence

A projection lens, a reticle stage and a light source optical system are supported by a cast frame above a wafer stage for holding a wafer thereon. A top portion of the cast frame has an enclosed hollow structure in which strengthening ribs are built, thereby substantially increasing the rigidity of the top portion. Since the ribs are built in the top portion of the cast frame, the surface area exposed to the wafer stage is reduced. As a result, there is little chance that the wafer is contaminated by any adherents to the cast frame.

Projection exposure apparatus containing an enclosed hollow structure

An exposure apparatus for exposing a substrate with light from a light source has a stage for moving the substrate along a substantially horizontal plane, a base member for supporting the stage, and a frame member having at least three mounts for supporting the base member. A first actuator system having a plurality of first actuators provided in the mounts, respectively, moves the base member in a direction substantially parallel to the vertical direction. A second actuator system having at least one second actuator provided in at least one of the mounts moves the base member substantially along the horizontal plane. A control means is provided to control the first and second actuator systems in a such a way as to suppress vibration of the base member.

Exposure apparatus having mount means to suppress vibrations

A step-and-repeat type exposure apparatus includes an X-Y stage for moving stepwise a workpiece such as a wafer relative to a projection lens system so that images of a pattern of an original such as a reticle are transferred onto different areas on the wafer in sequence. After exposures of such areas of the wafer that are included in one of plural regions of the wafer, the position of the wafer relative to the X-Y stage is shifted. Then, exposures of the areas included in another region of the wafer are effected. In another aspect, the step-and-repeat exposures of the wafer are effected along a direction inclined to the moving directions of the X-Y stage.

Method and apparatus for processing a plate-like workpiece

A device for supplying masks to be used in a chamber having a wall, comprises an opening formed in the wall of the chamber, and a rotatable shelf disposed in the opening and for carrying thereon the masks. The rotatable shelf is coupled, by way of a rotational shaft, to a portion of the wall adjacent to the opening and the rotational shelf has a mask carrying portion which is rotationally movable, about the rotational shaft, through the opening to and from the inside of the chamber and from and to the outside of the chamber.

Growing community of inventors

Kawasaki, Japan

Yukio Tokuda