Idemitsu Kosan Company, Limited

Yukio Shimane

Kazuyoshi Inoue

Koki Yano

Nobuo Tanaka

Tokie Tanaka, Legal Representative

Shigekazu Tomai

Shigeo Matsuzaki

Masato Matsubara

A sputtering target which is composed of a sintered body of an oxide containing indium, tin and zinc as main components; the atomic ratio of In/(In+Sn+Zn) being 0.10 to 0.35; the atomic ratio of Sn/(In+Sn+Zn) being 0.15 to 0.35; and the atomic ratio of Zn/(In+Sn+Zn) being 0.50 to 0.70; and containing a hexagonal layered compound shown by InO(ZnO), wherein m is an integer of 3 to 9, and a spinel structure compound shown by ZnSnO.

Sputtering target, transparent conductive film, and transparent electrode for touch panel

An amorphous transparent conductive film containing as a main component a six oxygen-coordinated metal oxide, and satisfying, in a radial distribution function (RDF) obtained by an X-ray scattering measurement, a relationship of A/B&#x3e;1, providing that the maximum value of RDF at an interatomic distance of from 0.30 nm to 0.36 nm is A and the maximum value of RDF at an interatomic distance of from 0.36 nm to 0.42 nm is B.

Amorphous transparent conductive film, target and production method for amorphous conductive film

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Sodegaura, Japan

Yukio Shimane